Used KOKUSAI Quixace II ALD High-k #9196893 for sale

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ID: 9196893
Wafer Size: 12"
Vintage: 2012
Vertical LPCVD furnace, 12" Model: DJ-1206VN-DF Process: CG System power rating: 480/120 Loading configuration: 5 System configuration: Furnace unit Valve box Gas box I/O Module Operation box Power box Blower box Currently installed 2012 vintage.
KOKUSAI Quixace II ALD High-k is a diffusion furnace and accessories designed for high-performance atomic layer deposition (ALD) processes. It supports an array of process functions including plasma-enhanced ALD and linear deposition of high-k films. The equipment combines powerful deposition capability and process control for efficient ALD processing. The high-k version of the Quixace II ALD furnace combines plasma and thermal deposition to create highly conformal, dense high-k films with exceptional uniformity. The system's self-contained plasma source offers high energy for fast deposition and excellent gapfill performance. In addition, the built-in temperature-controlled chamber ensures uniform thermal deposition when needed. Quixace II ALD High-k also provides user-friendly operation with its intuitive graphical user interface. A dynamic control unit automatically controls and optimizes the deposition parameters according to user input. Furthermore, the machine offers multiple wafer loading modes for manual or cassette loading, and it can be equipped with an external remote plasma source, allowing for processes such as pre-clean or RTO. KOKUSAI Quixace II ALD High-k also features an independent purge tool and a corrosion-resistant stainless steel process chamber for improved reliability. The asset is equipped with advanced diagnostics, including a mass flow controller, dedicated gauges, thermocouples, optical emission spectrometers, and metalorganic chemical vapor deposition (MOCVD) mass spectrometers. In addition, an external hot wall design allows direct viewing of wafer depositions, as well as a dedicated remote monitor for convenient and safe viewing. For advanced process monitoring, Quixace II ALD High-k model also offers a full suite of digital real-time metrology and control. Overall, KOKUSAI Quixace II ALD High-k equipment provides high-performance ALD for the production of uniform high-k films with exceptional speed and precision. It combines advanced technologies and an intuitive interface for both simple operation and complex process control. This powerful system provides a highly reliable and user-friendly platform for increasing productivity on the manufacturing floor.
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