Used ALCATEL / ADIXEN / PFEIFFER 601E #184115 for sale

ALCATEL / ADIXEN / PFEIFFER 601E is a high-precision etcher / asher designed for the production of advanced technology components. The etcher features a vacuum processing chamber with a temperature range from 0° to +800°C, a pressure range from 0 mbar to 1000 mbar and a maximum vacuum level of 1x10-4 mbar. ADIXEN 601E is equipped with a plasma source and can be used for etching and ashing of both dielectric and metallic thin-films with very high precision. The etcher offers precision control of the plasma source and chamber parameters, including pressure, temperature, RF power and RF/DC bias power. The built-in programmability also allows the user to customize the etch/ash process in order to achieve the desired results. The ergonomic design of ALCATEL 601E etcher allows for easy operation and integration into a production environment. PFEIFFER 601E offers an in-situ cleaning capability which is compatible with the etch/ash process. This helps to reduce the time required to clean the chamber between wafers, allowing for a more efficient process. Additionally, the etcher is equipped with an advanced safety system which protects the user from hazardous levels of RF radiation. 601E etcher is ideal for a variety of etch/ash processes such as dielectric etch/ashing, metal/dielectric etching and ashing, hardmasks etching and ashing and silicon oxide etch/ashing. It is capable of processing both 150mm and 200mm wafers, allowing for a wide range of objects to be etched and ashed with a high degree of precision. The combination of advanced etching and ashing processes, ergonomic design and safety features makes ALCATEL / ADIXEN / PFEIFFER 601E an ideal choice for high-tech component production.