Used ALCATEL / ADIXEN / PFEIFFER GIR 200 #9176768 for sale
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ALCATEL / ADIXEN / PFEIFFER GIR 200 is an etcher/asher with automated process control. It is designed for etching, cleaning, passivation, plasma treatments and more. It offers a maximum working pressure of 3.5 bar and a maximum substrate temperature of 350°C. The device runs on a Windows 10 operating equipment and is controlled by an intuitive user interface. Accessible functions include basic settings for pumping speed, process time, and temperature; manual process control; and auto-process start/end. It also features a unique backside exhaust port for remote operation. ADIXEN GIR 200 has a rigid mounting frame for easy integration into a fume hood or similar environment. It is designed with a corrosion-resistant steel interior and exterior for durability against most commonly used chemicals. Its enclosed etching chamber is outfitted with a touch-screen control for easy access to operational data and process controls. ALCATEL GIR 200 uses a gas mixing chamber to ensure accurate gas mixing ratios. The total gas mixing volume inside the chamber is 3 liters. This etcher/asher is powered by an advanced heating system that allows for precise temperature control and accuracy. The temperature range is from room temperature up to 800°C. PFEIFFER GIR 200 also features a high-precision, motorized chuck with three-axis X,Y and Z axes. This allows for accurate and repeatable processing of substrates with the highest accuracy. The device is highly flexible and can be used to etch substrates with a thickness ranging from 0.01mm to 3mm. GIR 200 is designed to ensure a highly repeatable and reliable etching process. It is also compliant with stringent safety standards, such as CE and UL. Additionally, the device includes a fault monitoring unit and can detect and alert operators to machine errors in real time. In conclusion, ALCATEL / ADIXEN / PFEIFFER GIR 200 is an advanced etcher/asher that is easy to use, ensures reliable results, and complies with safety standards. It is suitable for a variety of etching applications in research and industrial settings.
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