Used ANATECH P600 #9155507 for sale

Manufacturer
ANATECH
Model
P600
ID: 9155507
Plasma cleaner Box chamber Internal dimensions: 16" x 16" x 16" (3) Shelves (Downstream) RF Gen: 13.56 MHZ mod 600 (2) MFC Gas controls Fomblin prepped direct drive vacuum pump.
ANATECH P600 is an advanced etcher/asher for semiconductors, thin-film integrated circuits, and other microelectronic components. It is a single-chamberbatch model that boasts powerful and versatile process capabilities. This etcher/asher has a temperature range from -150 to 300°C for rapid fabrication of ultra-fine features with high-aspect-ratio of 1:10 or more. Its stainless steel chamber has a volume of 480 liters and is equipped with six 500W heater power supplies for uniform temperature distribution. Its fan-cooled heater elements provide a uniform heating during the ashing process. In addition, P600 etcher/asher utilizes an RF plasma source to clean and etch the surfaces of materials efficiently and economically. This model is capable of using oxygen, nitrogen, argon, and other dry gases to create a process environment that meets the requirements of the etching application. It has four RF power levels ranging from 0 to 500 Watts, allowing it to create optimized process conditions for different projects. ANATECH P600 etcher/asher features a 3.8-inch LCD interface which allows the user to set and adjust all necessary parameters for a successful application of etching and ashing processes. This includes temperature, pump speed, RF power, flow rates, and other product-specific parameters. Additionally, users can monitor the process pressure, temperature, and vacuum levels to ensure that the conditions needed for etching and ashing are being achieved. The chamber is supplied with a leak detector that enables it to make corrections before the process begins to ensure that perfect conditions are met. P600 etcher/asher has a robust window cleaning system that helps to enhance sample visibility and reduce contamination. It is also fitted with a quartz crystal microbalance (QCM) system which can monitor the deposition rates of various process steps. The nitrogen-purge system helps to prevent sample oxidation, and the water-cooled windows provide protection from radiant heat. The etcher/asher is compatible with many different gas sources, making it a suitable choice for many excimer laser, plasma, anisotropic, directed-energy deposition, and other applications. Its environmentally-friendly design makes it ideal for laboratories where sustainability is of great importance. ANATECH P600 etcher/asher is reliable, efficient, and easy to use, making it an excellent solution for any microelectronics-related application.
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