Used LAM RESEARCH TCP 9400 SE II #9158145 for sale
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ID: 9158145
Wafer Size: 6"
Etcher, 6"
Chamber assembly: x2 LL, Proc chamber
Monitor type: LCD
Signal tower: (3) Colors
Pres control: Automatic
Chuck type: Mechanical
RF Generator: RFG 1250
Turbo: EDWARDS A2203C
Gasbox channel: (8) Channels
Series 65 pendulum valve
(2) Gas rings with ceramic insert
Quick clean chamber liners
Dynamic offset ESC power supply and minimatch upgrade
Quick clean endpoint windows
EPROM upgrade for the VAT valve (no preset requirements)
EPROM upgrade for the TCP digital match controller (ISI controller)
Quartz edge ring (greater MTBC)
Currently de-installed.
LAM RESEARCH TCP 9400 SE II is a powerful etcher / asher designed for both advanced and established users alike. Offering exceptional precision and speed, this equipment features a wide variety of advanced features and capabilities. High-performance RF Generators provide rapid, repeatable etching. An easy-to-use touch-screen control panel allows users to program and monitor their etching parameters with minimal effort. Advanced algorithms built into the system allow for an unprecedented level of repeatability across multiple substrates, assuring a consistent etch profile on any material. In addition to individual run detailed data logging, the unit can log up to the last 10 runs, ensuring process consistency and providing valuable insights into the etching process. The machine also boasts a specially designed safety chamber designed to contain highly hazardous etching gases, protecting both the user and the environment from exposure. Equally as impressive is its robust suite of precision metrology capabilities, allowing users to analyze and monitor etching results to guarantee accuracy and repeatability. TCP 9400 SE II is a powerful etcher / asher solution designed to handle even the most demanding etching applications with precision and speed. Its intuitive software platform, advanced safety features, and reliable metrology capabilities make it an ideal solution for both established and aspiring users alike. Whether etching individual substrates or highly complex structures, this high-performance tool is designed to deliver a consistent and reliable etch every time.
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