Used MARCH AP 1000 #9114384 for sale

MARCH AP 1000 is an etcher / asher equipment ideal for a wide range of plasma-based processes, such as sputtering and etching. The system is capable of handling a wide variety of substrates, including silicon and compound semiconductors, glass, metals, ceramics, and organic materials. The unit is equipped with an advanced power supply, providing both DC and pulsed power operation, along with a multi-pocket non-magnetic process chamber to allow multiple processes to run simultaneously. MARCH AP1000 also features a temperature-controlled environment allowing for precise temperature regulation and uniformity throughout the process chamber. AP-1000 design features an advanced process chamber, ensuring maximum uniformity and performance. It features an 80rpm rotation rate, capable of setting up to 8 process parameters, allowing users to perform various processes such as sputtering, etching, or any combination of the two. The machine is also capable of generating gas flows up to 3.5CFM and has a capability of processing wafers up to 8" in diameter. Additionally, it is equipped with a vacuum gauge, an alarm tool, and a safety asset to alert operators in the case of potential problems. AP 1000 also includes a variety of advanced control and monitoring features. For example, the model includes an auto process control (APC) equipment, enabling users to set up tasks quickly and easily. For further process control and monitoring, the system also has a flow and pressure gauge to control gas flow, an internal vacuum control unit, manual pressure control, and an overload protection. AP1000 is an ideal machine for processes such as etching, sputtering, and more. It is capable of handling a wide variety of substrates including silicon, glass, metals, and organic materials. In addition, the tool is equipped with multiple safety and control features to ensure operators have the highest degree of safety and process control. Finally, its versatile design and advanced controls and monitoring capabilities provide users with an optimal solution for plasma-based processes.