Used STS / CPX Multiplex ASE ICP #9139666 for sale

STS / CPX Multiplex ASE ICP
ID: 9139666
Wafer Size: 6"
Etcher, 6".
STS / CPX Multiplex ASE ICP is an advanced Crystal Plate etcher for semiconductor and solar industry applications. It is a parallel processing etcher with outstanding speed and precision, designed to achieve extremely high throughput in the most complex etch environments. It is a fully automated equipment that combines multiple etching processes in one platform and provides full system control during the entire etching process. STS Multiplex ASE ICP is equipped with three etching modules for simultaneous patterning of multiple wafers. It has an advanced integrated fan-out module for high-accuracy pattern transfer from main cassettes to wafer holder, ensuring fast turn-around time and precision etch results. The large 12-inch wafer capacity allows for etching multiple substrates in one load. CPX Multiplex ASE ICP operates under a closed loop unit to ensure complete process control. It is equipped with an advanced gas control machine comprised of a gas mixing chamber, vacuum source, and an ion source. The gas control tool also applies a very precise and controlled etchant gas flow to ensure uniform etching. Multiplex ASE ICP also offers extremely precise patterning capabilities. It has an integrated image processing asset that utilizes high-resolution cameras to accurately determine etch location. The model also has advanced source power control and deposition control resulting in excellent shape accuracy and low temperature deformation. In addition, the machine features a 100% isolation equipment to enable protection of process sensitive materials. Its advanced cooling systems use multiple heat sinks to ensure fast and uniform wafer cooling. The chill loops ensure fast wafer recycling for repeatable etching of complex shapes. Overall, STS / CPX Multiplex ASE ICP is an advanced and reliable etcher that is suitable for designs with intricate and complex shapes. The machine is reliable and efficient, offering high precision etching and full process control throughout. With its diverse etching capabilities, it can provide great results for a variety of semiconductor and solar industry applications.
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