Used STS / CPX Multiplex ASE ICP #9179213 for sale

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ID: 9179213
Wafer Size: 6"
Etcher, 6" Manual load Single wafer load lock Standard rate ASE PFEIFFER TMH 100PC Turbo pump TCP 600 Controller RF Trolley ENI ACG3 300W RF Power supply for lower electrode ACG10B 1000W RF Power supply for upper electrode Tuner Remote gas box: (4) MFCs (Ar,O2, SF6, C4F8) 208V.
STS / CPX Multiplex ASE ICP etcher / asher is a highly advanced tool for etching and ashing wafers. It is a multi-zone equipment that allows different etching and ashing processes to be performed in different chambers simultaneously. The system is equipped with a high-frequency power supply and sophisticated digital control systems, which give the user complete control over the etch and ash process. STS Multiplex ASE ICP etcher/asher is a highly efficient unit that offers both inductively coupled plasma (ICP) etching and ashing. It has been designed to operate preciously and continuously at high pressure, thus delivering superior wafer finish and uniformity. The machine's plasma source and integrated RF matching network are carefully designed to minimize hydrogen dilution in the plasma, helping to ensure a very smooth film profile. The ICP chamber of CPX Multiplex ASE ICP etcher/asher is also designed to accommodate high-power densities and high-pressure operation, making it ideal for the most complex etch jobs. It features a copper liner, which helps to reduce parasitic capacitance and improves repeatability and gauge control of the etch process. In addition, the chamber's specially designed wall strips ensure a full 360 degree coverage of the etch area. Multiplex ASE ICP etcher/asher is outfitted with a high-resolution digital imaging tool that can accurately monitor and measure the shape and profile of the wafer during the etch process. This asset also allows the user to store and recall results and use it to monitor the etch processes over time. STS / CPX Multiplex ASE ICP etcher/asher is a very reliable tool that is capable of delivering high-quality results in a timely manner. It provides an advanced platform for the etching and ashing of a wide variety of wafers, allowing for highly complex processes to be quickly and efficiently completed. This makes the model ideal for applications in a variety of industrial, medical, and automotive sectors.
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