Used STS / CPX Multiplex ASE #9118795 for sale

STS / CPX Multiplex ASE is an advanced asher/etcher designed to provide efficient and reliable nitrogen and oxygen plasma etching in semiconductor fabricating processes and related applications. It is a single-chamber equipment that enables the use of either nitrogen (N) or oxygen (O) gases for reactive-ion etching (RIE). The system is suitable for both small batch and high-volume production, offering excellent performance, accuracy, and repeatability. The unit consists of an evacuated process chamber with an externally-mounted RF generator that supplies up to 6000 watts of power. It is built with a decoupled RF generator which helps maintain uniform etch properties on wafers of different types and diameters. The RF generator is also capable of providing up to 1000 volts, enabling it to run processes at higher pressures (up to 5 torr) and with higher etch rates. STS Multiplex ASE includes a versatile gas injection machine with a flow rate range of 0 to 300 ml/min, allowing it to handle both dry and wet etches. The tool is capable of handling all standard etching chemistries, such as CF4, CHF3, C4F8, CH2F2, Ar, He, and SF6. Its gas delivery is extremely efficient and economical, with minimum wastage and no chemical contamination. CPX Multiplex ASE is equipped with an integrated digital pressure controller, enabling the user to precisely control the chamber pressure. It also features a built-in high-precision temperature control asset that ensures sample temperatures remain stable and accurate during processing. An automated data-logging feature records all relevant process parameters, such as gas flow rates, chamber pressures, voltage levels, and sample temperatures. This ensures traceability and repeatability of process conditions. Finally, a unique chamber "view" feature allows the user to see the interior of the chamber from outside the unit, making it easier to check chamber and sample conditions. The model is also designed to be compatible with most peripheral hardware, such as vacuum pumps, RF generators, and temperature controllers. In conclusion, Multiplex ASE is an advanced asher/etcher designed for efficient and reliable plasma etching of semiconductor substrates. It is an integrated single-chamber equipment featuring a versatile gas injection system, a high-precision temperature control unit, data logging, and an easy-to-use user interface. It is suitable for both small batch and high-volume production, and is a reliable and economical choice for semiconductor fabricating processes.