Used STS / CPX Multiplex ICP #9158194 for sale

STS / CPX Multiplex ICP is an etcher/asher designed to work with a process column for multiple etch/ash operations in an advanced technology environment. This device features an integrated equipment which can be used in a dual-chemistry environment and process multiple wafers simultaneously. This capability allows users to reduce operation times and improve efficiency. STS Multiplex begins with an ICP etching system. This unit works by allowing material to be stripped off a wafer to create a pattern in a pre-defined topography. A plasma with a high density of charged particles is produced by a low-pressure chamber and is used to strip material from the wafer. It then passes through a series of shields that isolate the chamber from the outside environment. Once the etching process is complete, the wafer is then transferred to the ashing machine. This tool is similar to the asset used for the etching but utilizes a different type of plasma. This plasma produces a high density of free radicals which breaks down organic contaminants on the wafer. The wafer then passes through a series of heated ovens which dry and remove the remaining contaminants. CPX Multiplex is a reliable high-performance model that offers versatility and precision. The device is adjustable and can be programmed to etch and ash a wide variety of materials. The equipment also has a monitor and monitoring algorithm which allows users to monitor and adjust the process parameters as necessary. This is important in order to ensure the highest quality etch and ashing results. The improved technology in STS / CPX Multiplex makes it one of the most reliable and efficient ways to produce a consistent quality etching and ashing. This system is ideal for advanced technology operations such as IC fabrication and MEMS production. STS Multiplex is designed to offer versatile and precise process capabilities while improving overall productivity.