Used STS / CPX Multiplex #9095065 for sale
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ID: 9095065
Wafer Size: 3"-8"
Vintage: 2001
RIE System, 3"-8"
Load lock
PC Controlled RIE process chamber
Power distribution cabinet
RF Rack
Remote gas box
Chiller
Includes:
LEYBOLD HERAEUS Ecodry L rotary pump
MESC RIE SC100M Process chamber
PC Controlled
Intellimetrics
End Point Detector (EPD)
Frame grabber
Electrode temperature control: +5°C to +40°C
Non-clamped electrode
ENI ACG3B RF Supply and matching unit, watt: 30-300 (13.56 MHz)
LEYBOLD Dryvac 50S dry pump
Electrode cooling:
BETTA-TECH CU500 chiller with DI water
Temperature range: +5°C to +40°C
Gas boxes:
Remote R/H Standard (2) PFC1 module
(4) Gas lines
(2) Non-corrosives
(2) Corrosive process gasses
Load lock with EMO
Operator panel with keyboard
Touchscreen lights
Buzzer
Panel for EPD
TFT Monitor, 18"
Multiplex atmospheric cassette system
MACS Module for automated wafer loading
(2) Cassette automatic modes
Manual mode / Cassette to Cassette
Manual wafer load
2001 vintage.
STS / CPX Multiplex is an etcher/asher that is used for substrate preparation and other similar processes. It uses a combination of Substrate Transfer Equipment (STS) and Chemical Platinum Exchange (CPX) technology in order to produce high-resolution patterns that will meet the most stringent of requirements. It is capable of etching and ashing processes such as substrate transfer, resist strip, passivation, chemical-mechanical polishing, substrate transfer, and more. STS Multiplex features a high-precision, multi-directional gas delivery system, high-selectivity ion beam, and variable power settings. This combination of technology provides high-resolution etching and ashing results with minimal impact on the substrate. The variable power settings allow for fine-tuning of the process to suit the customer's application and needs, while the high-selectivity ion beam provides for a precise pattern etching and ashing. CPX Multiplex is designed to achieve the highest quality results with minimal waste, as well as a low cost of ownership. This is achieved through the unit's focused power, its advanced processes and its precise control mechanisms. On top of that, it is also built with features to ensure safety and reliability such as dust collection, automatic calibration, and thermal management systems that help ensure that the machine operates within required parameters. Multiplex is suitable for use in both industrial and research applications. It is capable of processing a wide range of substrates, and can be used in tandem with other etcher/asher systems. Additionally, it is capable of handling large payloads and can reduce process times up to 40%, resulting in increased efficiency and cost savings. Overall, STS / CPX Multiplex is an etcher/asher that provides a high-resolution etching and ashing solution for a variety of applications. Its combination of technologies provides high-precision results with minimal waste, and its advanced processes and control systems ensure safety and reliability. Its ability to process large payloads allows for reduced process times that will result in increased efficiency and cost savings, making it an ideal solution for both industrial and research applications.
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