Used KURT J. LESKER PVD 75 #9164257 for sale

KURT J. LESKER PVD 75 is a sputter deposition equipment that can deposit mechanical, optical, electrical, and magnetic films onto substrates. The system utilizes four independently controlled sputter targets, from 75 mm to 150 mm in diameter, which allow for the deposition of up to four different materials at the same time. PVD 75 utilizes a triode sputter gun to direct inert gases (most commonly argon) onto the target material, allowing for the ejection of surface material and its collection onto substrates located in the chamber. The targets are housed in a load-lock chamber in order to enable easy target access and to minimize contamination of the chamber and substrates. The base pressure of the load lock is maintained at 6 x 10-6 Torr when the unit is not in use. KURT J. LESKER PVD 75 also features a computerized control machine with a 19-inch touch screen that allows users to easily navigate through the machine functions. The control tool includes menu-driven settings for process information, process recipe information, asset status, support tools, data logging, data port connectivity, and other custom features. The sputter deposition process takes place under vacuum, and the model offers exceptional vacuum performance. The lowest achievable pressure is 5x10-5 Torr. A turbo molecular pump, backed by a combination of a diaphragm-mechanical pump, gives PVD 75 fast pump down times with a pressure rise of not more than 2x10-5 Torr in less than five minutes. KURT J. LESKER PVD 75 includes an integrated sample heating equipment, allowing for up to 500 degrees Celsius of substrate temperature. The system also enables precise control of substrate and target distance for uniform deposition. The interlock unit of this sputtering machine is designed to protect the components from damage due to overvoltage or exposure to excessive temperatures. PVD 75 also features an extensive safety tool with fault recognition and alarm capabilities. KURT J. LESKER PVD 75 is a reliable, state-of-the-art sputtering asset that is ideally suited for a wide range of sputter deposition applications. Its compact design, integrated heating and safety systems, and fast pump down times make it an ideal choice for research and industrial applications.