Used ORC HMW-615N-4 #9138204 for sale

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ORC HMW-615N-4
Sold
Manufacturer
ORC
Model
HMW-615N-4
ID: 9138204
UV luminometer.
ORC HMW-615N-4 is a powerful and efficient exposure equipment designed for use with a variety of photolithography processes. This system is equipped with a HeNe 515nm laser source, enabling a wide exposure range from 0.5 μm to 6 μm. Additionally, the unit is capable of up to an 800 W/cm2 output power and is capable of high-precision alignment using micrometer scales. The laser source of the machine is extremely reliable and accurate, enabling a high throughput while maintaining exceptional quality of results. Additionally, the laser source is equipped with wavelength and bandwidth adjustment capabilities, offering great flexibility to users and allowing the exposure tool to be operated in a variety of photolithography processes. The asset is equipped with an active optics module (AOM), allowing for accurate alignment of the model and precise adjustments of the viewing position of the substrate. Furthermore, the equipment can be equipped with either a manual or motorized stage for easy substrate positioning, precisely controlled by a joystick or computer control. Additionally, the laser source can be accurately aligned using micrometer scales. In terms of safety, ORC HW-615N-4 is equipped with a several safety features. These include back-pressure sensors, an emergency shut-off switch, an emergency stop button, an exhaust filter, and an emergency cooling fan for preventing excessive heat build-up. In terms of usage, the system offers a great range of applications, making it perfect for photolithography processes in the semiconductor industry. It is also extremely user-friendly, enabling a wide range of easy-to-understand adjustment options and presets that can be quickly configured to suit the user's needs. HMW-615N-4 is a compact and cost-effective exposure unit with an impressive array of features that make it great for photolithography processes. Its reliable performance, adjustable settings, and safety features make it an ideal choice for high-throughput processes in the semiconductor industry.
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