Used AMAT / APPLIED MATERIALS Quantum X Plus #9172233 for sale

AMAT / APPLIED MATERIALS Quantum X Plus
ID: 9172233
Wafer Size: 12"
High current ion implanter system, 12".
AMAT / APPLIED MATERIALS Quantum X Plus is an advanced ion implanter and monitor designed to optimize semiconductor device performance. It is specifically tailored to help engineer semiconductor substrates for maximum circuit performance. AMAT Quantum X Plus contains many features that allow for superior performance and control of the implantation process. The equipment includes a fully-integrated particle accelerator capable of achieving ions up to 240 keV of energy, enabling implantation into silicon substrates with a high degree of accuracy. Additionally, the system is designed with integrated precision optical alignment and a carrier unloading unit to enable efficient and accurate core alignment for optimal implant performance. This machine can be integrated with AMAT Implant Sentinel II tool, which measures the precise angle of implantation. The tool is capable of utilizing different masks and high levels of precision and accuracy to ensure the perfect alignment and implantation. APPLIED MATERIALS Quantum X Plus also comes with the advanced Ultra-Sense implantation and monitoring technology that allows operators to upgrade their device performance by controlling and monitoring all critical implant parameters in real-time. The nitrogen-cooled magnetron source on Quantum X Plus has superior auto-meshing capabilities and offers the highest implant angles in the industry. This allows precise implant angles as fine as 0.2 mm and highly tunable profiles allowing for very fine-grained adjustment of ion beam energy and angle distribution. AMAT / APPLIED MATERIALS Quantum X Plus can be used for a variety of materials from silicon to gallium arsenide, and is capable of delivering very fine grain doping and removal doses provided by other tools. AMAT Quantum X Plus is a complete tool engineered to deliver superior device performance and control. The asset includes a powerful beam control model with ion beam profiles and flux monitoring capabilities. Additionally, APPLIED MATERIALS Quantum X Plus contains several other features such as real-time process monitoring, ion beam power and beam position control, explicit implant rates tuning, and beam modulation capabilities. These features help the equipment automate the implant process, ensure high quality implants, and reduce turnaround time. Quantum X Plus is a powerful and highly versatile ion implanter and monitor tool. The system is engineered to produce optimal semiconductor device performance, with its integrated particle accelerator, precision optical alignment, and advanced Ultra-Sense implantation and monitoring technologies. It allows operators to control and monitor various implant parameters for more accurate and reliable implantation and it is capable of implantation into various materials including silicon and gallium arsenide. It is a great choice for engineers seeking superior device performance and control over their implant processes.
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