Used AMAT / APPLIED MATERIALS Quantum X Plus #9185368 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

AMAT / APPLIED MATERIALS Quantum X Plus
Sold
ID: 9185368
Wafer Size: 12"
Vintage: 2005
High current implanter system, 12" Single wafer Energy option: LEAP Ultra low (0.2-80 keV) Stand-alone system enclosure Signal tower: Front / Back tool Processor: ISPM Processor Isocentric scanner Beamline: Ultralife QX+ ion source G1 Electrode: Graphite Gas panel box: Argon system and gas purge TEM Vacuum: LEYBOLD Turbo pump (3) Cryo pumps SPECTRA Residual gas analyzer (RGA) MMTX Transformer Gas panel: 8-Position: AsH3, PH3, GeF4, BF3, SiF4, CO2, 2-Blank Wafer loader: 4 Station SEMI standard wafer loader Hermos tag reader SEMI E84 OHT PIO Kits Low backside particle vacuum end effectors 2005 vintage.
AMAT / APPLIED MATERIALS Quantum X Plus is a state-of-the-art ion implanter and monitor designed to help manufacturers achieve the highest quality ion implantation. This device offers superior performance through its patented ion delivery and control equipment, precise energy level setting, and online monitoring of dose rate. It also provides greater system reliability and robustness, as well as improved performance over conventional ion implanters. AMAT Quantum X Plus' ion delivery unit allows for delivery of ions to the target substrate that are very accurately controlled and precisely measured. This machine utilizes a quadrupole design that allows ions to be focused and directed accurately at the target substrate. This ensures that ions are precisely directed to where they are needed and the desired concentration is achieved. In addition, APPLIED MATERIALS Quantum X Plus utilizes an adjustable energy level setting that ensures the ions enter the target substrate with the required energy level, allowing for better control of the implantation process. The online monitoring tool of Quantum X Plus enables real-time monitoring of the dose rate and substrate coverage. This ensures that the ion implantation process is optimized and monitored while in progress. It also provides manufacturers with useful information regarding the use of different implantation doses and energy levels, which allows them to make necessary adjustments to the implantation process if needed. The robustness of AMAT / APPLIED MATERIALS Quantum X Plus is further enhanced by its superior cooling asset. The manufacturer has deployed advanced chillers in the device which are designed to keep the facility temperature down, ensuring the ions remain focused and stable during implantation. The device also employs a unique active-shifting model that continues to monitor the dose rate and substrate coverage during operation, allowing the implantation process to remain stable and accurate. In conclusion, AMAT Quantum X Plus is the next generation of ion implanters and monitors, providing improved performance, greater equipment reliability and robustness, and precise energy level and dose rate monitoring. Its various components such as the ion delivery and control system, adjustable energy levels, online monitoring, and robust cooling unit, all contribute to a superior ion implantation process.
There are no reviews yet