Used AMAT / APPLIED MATERIALS Quantum X #9181010 for sale

AMAT / APPLIED MATERIALS Quantum X is a world leading ion implanter and monitor equipment. AMAT Quantum X combines advanced ion implantation technology with superior imaging solutions that produce outstanding device performance and reliability. The system's superior process control ensures consistent results while its advanced imaging capabilities provide detailed process monitoring for improved results. APPLIED MATERIALS Quantum X features an advanced, high-efficiency ion source that produces a wide range of ions including arsenic, boron, nitrogen, and phosphorus ions. These ions enable implantation of up to 16-levels and reduce the implantation time, resulting in an increased throughput rate and improved device performance. The unit also features a patented multi-beam scanning machine that delivers precise control of the implantation process. Its advanced RF-bias and energy database tool ensures that the ion trajectory and beam current is dynamically optimized throughout the entire implantation process. This ensures improved accuracy, repeatability, and throughput rate when compared to older models. The integrated monitor asset of Quantum X delivers accurate control over the ion implantation process. It features a high-resolution image sensor that records real-time images of the implantation process and provides an easy to interpret graphical representation of the beam current, energy, pulse width, and other vital process parameters. It also includes a user-friendly graph overlay model that allows users to easily analyze and optimize the process parameters to produce the best results. The equipment is designed to interface with a wide variety of external products and incorporates a host of safety and security features that ensure compliance with industry standards. This makes AMAT / APPLIED MATERIALS Quantum X an indispensable tool in implantation processes, from research and development to large-scale production. In sum, AMAT Quantum X from AMAT is a highly reliable, advanced ion implanter and monitor system that enables excellent device performance and reliable, repeatable implantation results. Its advanced RF-bias and energy database unit ensures optimal ion beam parameters while its integrated monitor machine delivers precise process control. Finally, its safety and security features guarantee operator safety and regulatory compliance.