Used AMAT / APPLIED MATERIALS Quantum #9187369 for sale

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ID: 9187369
Implanter chassis P/N: 9090-00803 9090-00827 9090-00923 ITL 9090-00961 9090-00456 9090-00859 9240-04325 0090-91694 9240-04327.
AMAT / APPLIED MATERIALS Quantum is an ion implanter and monitor that is used in the semiconductor industry. It is used to implant ions into semiconductor materials during the manufacturing process in order to achieve desired electrical properties. The equipment is capable of implanting ions up to 48 cm in depth and can be used for various semiconductor processes, including ion implantation, rapid thermal annealing, and diamond-like coating. AMAT Quantum can implant most of the common ions used in semiconductor technologies, such as boron, phosphorus, nitrogen, and oxygen. It features adjustable beam energy and adjustable beam currents and can impart electrons with energies ranging from 0.1 to 10 MeV. The implanter can also handle high temperature annealing processes, with temperatures of up to 1000 degrees Celsius. APPLIED MATERIALS Quantum also functions as a monitor to monitor the implantation process. The system monitors such parameters as beam current, beam voltage, beam spot size, and beam tip size. It also has a multi-channel signal acquisition unit, which is used to measure the implanted ions. Furthermore, it can measure the ion charge state, allowing the user to adjust the implantation parameters accordingly. Quantum is extremely user-friendly, with a 2-D view port, allowing real-time observation of the implantation process. The implanter also features an intuitive graphical user interface, making it easy to operate and monitor. The machine utilizes modern data acquisition and analysis technology, which allows precise measurement and control of the implantation process. Overall, AMAT / APPLIED MATERIALS Quantum is an advanced and highly capable ion implanter and monitor that can be used for a variety of semiconductor production processes. It offers adjustable beam energy and current, as well as multi-channel signal acquisition and monitoring systems, allowing the user to have maximum control and accuracy during the implantation process. It also has an intuitive graphical user interface, making it easy to operate and monitor.
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