Used AMAT / APPLIED MATERIALS Vista 810 #9187815 for sale

AMAT / APPLIED MATERIALS Vista 810 is an ion implanter and monitor tool that is designed for advanced semiconductor processing. It is a highly efficient and accurate device that is used for implantation of dopants into silicon substrates and provides real-time process control. AMAT Vista 810 is equipped with a three-gas source for nitrogen (N2), phosphine (PH3), and silane (SiH4) implanting of substrates. It also utilizes a high-precision beam current measurement equipment with two miniature Faraday cups that can achieve current resolution and sensitivity up to 0.5pA, which enables precise control of ion density, angular divergence, and lateral spread. Moreover, it can operate at significantly higher dose rates compared to conventional implanters due to its high average beam current of up to 50mA. APPLIED MATERIALS Vista 810 also features an automated wafer-handling system and an integrated laser scatterometer (LSC) unit that provides highly accurate, real-time process control. The LSC machine allows users to monitor the implantation process with regards to layer depth, uniformity, and profile accuracy. Furthermore, it also includes an integrated, multi-channel digital shaping tool that enables precise control of the energy level, dose, and implant angle. Vista 810 also features advanced analytical tools such as a data archiving asset and a means for process modeling so that users can accurately predict and monitor machine performance. This comprehensive data analysis allows users to optimize for layer depth, uniformity, profile accuracy, and contamination, while the integrated model-based control model ensures optimal machine performance. Overall, AMAT / APPLIED MATERIALS Vista 810 is an extremely sophisticated, reliable, and accurate ion implanter and monitor that is designed for advanced semiconductor processing. It offers exceptional performance and an impressive range of process control capabilities that enable users to accurately implant dopants and monitor the implantation process with results that are highly reproducible and reliable.