Used AMAT / APPLIED MATERIALS xR Leap #9174557 for sale
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ID: 9174557
Ion implanter, 8"
Main components:
Processor module
Beamline module
Source services module
Processor rack
Heat exchanger / PDU
Mobile PC & desk
Clean room PC
Enclosure
Signal tower
TEM Probe
No VESDA smoke detector
ISO TX
Mains matching TX
Beamline, controllers PSU's and assy:
Pre accelerator / Mag controller
Beamline inst
Vacuum controller
Post A controller
Turbo controller
Focus PSU
Decel PSU
A Mag PSU
Pre A converter PSU
Source mag PSU
Suppression PSU
Beam path components, source / Extraction / Flight tube / MRS and PFS assy:
Source head type: IHC
Extraction type: Dual bellows
Flight tube
MRS
Pre defining
PFS Type: HD PFS
Gas cabinet (Source services):
PH3 Module: SDS
AsH3 Module: SDS
Boron: HP
Ar: HP
Purge module
PSU's, Controllers and assy:
Gas and temperature control
Filament PSU
Arc PSU
Bias PSU
DPS
Pre A HV stack
G2 PSU & Components
Vacuum system:
Make / Model / Description
SEIKO SEIKI / STP-1000 / Source turbo pump
SEIKO SEIKI / STP-450 / MRS turbo pump
CTI / OB-10 / Side cryo pump
CTI / OB-10 / Rear cryo pump
Processor PSU's controller and assy:
Wheel & components
Spin motor
Gripper
Transfer arm
Clip actuator
Blade
A/B Sensor
Tilt assy
PFS DP Box
Beam stop
Beam profiler
Filament PSU (PFS)
Wafer loader / Mini environment assy:
Carousel
Indexer
W/L Door
Orientor
Cassettes / Trays
Arm servo PSU (XR80)
Arm servo cont (XR80)
ISO TX 9500
Post A:
No HV stack
No converter PSU
No controller
Control rack:
DAQPDU
Option chassis
Target sys inst
W/L Cont
W/L Vacuum
Ground PDU
Target sys vacuum
Spin / Scan cont
Direct drive interface
Plasma flood chassis
Scan amp
Spin amp
Spin / Scan PDU
Bleed resistor
Motech 80
VME:
CPU Main board
Loop cont
Energy level: 0.2-80 keV
1996 vintage.
AMAT / APPLIED MATERIALS xR Leap is an advanced ion implanter and monitor used in the semiconductor fabrication process. It is designed to deliver high-precision, ultra-fast implantations of dopants into substrates for use in the manufacturing of semiconductor devices. It leverages sophisticated software and hardware solutions to provide the highest levels of accuracy while also providing a wide variety of customization options for customers to tailor the solution to their specific needs. AMAT xR Leap features an intuitive graphical user interface, dual-beam ion source technology, a stationary magnetic field, and advanced magnetic insulation capability to ensure high-precision implantation rates and particle densities. The integrated monitor equipment allows for real-time measurement and quality control, while the optional data acquisition system, combined with a 2D image acquisition and analysis software suite, makes sure that the process is highly automated and traceable. The unit also offers dual-stage comb drive technology for highly accurate beam scanning and simultaneous implantation of multiple implant species. It is also capable of achieving up to 250W dose levels, and its high-efficiency electron cooling technology guarantees low levels of post-implant energy boosting. Furthermore, APPLIED MATERIALS xR Leap machine is highly scalable and designed to accommodate different levels of implantation rate, beam insensitivity, and voltage control. It also comes equipped with sophisticated hardware and software diagnostics, allowing technicians to monitor and maintain the overall performance of the tool. XR Leap's built-in safety features make it a much more reliable option for the most demanding semiconductor fabrication processes, which helps minimize maintenance costs, reduce downtime, and optimize efficiency. Additionally, the asset is easy to customize and install, making it an ideal choice for a wide range of industries.
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