Used AMAT / APPLIED MATERIALS xR80 Leap II #9174553 for sale
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ID: 9174553
Ion implanter, 8"
Processor module
Beam line module
Source services module
Processor rack
Heat exchanger / PDU
Mobile PC and desk
Monitor
Control module (VME)
Signal tower
TEM Probe
Mains matching TX
No VESDA smoke detector
No ISO TX
Beamline, controller PSU and assembly:
Pre accelerator / Mag controller
Vacuum controller
Post A controller
Turbo controllers
Focus PSU
A-Mag PSU
Pre A converter PSU
Source mag PSU
Suppression PSU
No Decel PSU
Beam path components, source / Extraction / Flight tube / MRS and PFS assy:
Source head type: IHC
Extraction type: Dual bellows
Flight tube
MRS
Pre defining
PFS Type: STD PFS
Gas cabinet (Source services):
Module: SDS / HP
GeF4: HP
BF3: HP
(2) Modules: SDS
Purge module
PSU, Controllers and assembly:
Gas and temperature controller
Filament PSU: XANTREX
Arc PSU
Bias PSU
DPS
Pre A HV stack
Source ISO TX
Vacuum system:
LEYBOLD 1000C Source turbo pump
LEYBOLD 361C MRS Turbo pump
TURBOTRONIK NT20 Turbo pump controller
EDWARDS QDP40 Beam line dry pump
CTI CTI-10 Side cryo pump
CTI CTI-10 Rear cryo pump
Processor PSU controller and assy:
Wheel and components
Spin motor
Gripper
Transfer arm
Clip actuator
Blade
A/B Sensor
Tilt assembly: 0-10
PFS DP Box
Beam stop
Beam profiler
Filament PSU (PFS)
Wafer loader / Mini environment assembly:
Carousel
Indexer
W/L Door
Orientor: Notch
(3) Cassettes / Trays
XR80 Arm servo PSU
XR80 Arm servo controller
Control rack:
DAQPDU
Target system
W/L Controller
W/L Vacuum
Ground PDU
Target system vacuum
Spin / Scan controller
Direct drive interface
Plasma flood chassis
Scan amplifier
Spin amplifier
Spin / Scan PDU
Bleed resistor
MOTECH 80
VME:
PMAC Vac / Atoms
CPU Main board
Loop controller
Energy level: 2-80 keV
1997 vintage.
AMAT / APPLIED MATERIALS xR80 Leap II is an ion implanter and monitor, specifically designed for use in manufacturing semiconductor wafers. It allows for high-precision implantation of ions into the material, resulting in a highly uniform doping profile. It features an advanced variable beam source, which enables precise control of ion energy and dosage. The ion source is equipped with a high-precision magnetic field generator for accurate beam deflection. AMAT xR80 Leap II ion monitor features an advanced calibration equipment that uses real-time feedback to ensure fine-grained data quality, along with automated safety checks to ensure uniform implantation across the entire wafer. It uses an Adaptive OpticsPlatform (AOP) to measure and adjust the dose in real-time, as well as a multi-channel photodetector array to collect detailed position information. AMAT xR80 also features a Smart Beam Alignment System (SBAS), which eliminates the need for manual intervention and enables high-fidelity placement of ions into the wafer. The SBAS also ensures that the dose is accurately set and maintained across a range of angles and distances. The xR80 boasts a very low failure rate, thanks to its robust design and its sensor monitoring unit. It is also capable of heating the wafer to within 10˚C of absolute zero, ensuring that the ions remain in place regardless of the environmental conditions. In terms of safety, APPLIED MATERIALS xR80 Leap II is equipped with safety interlocks and has been certified for USDOT (U.S. Department of Transportation) compliance. The enclosure is coated with anti-static inhibitors, making it compliant with the latest CE standards. It also features a security login, allowing only authorized personnel to be in the vicinity. XR80 Leap II is an all-in-one ion implanter and monitor, designed to help users achieve clean, uniform doping in their semiconductor wafers. It features advanced beam adjustability, a real-time data quality control machine, and a variety of safety features, making it an excellent choice for any laboratory or fabrication environment.
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