Used AMAT / APPLIED MATERIALS xR80 #9197630 for sale
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ID: 9197630
High current implanter, 8"
P/N: 0240-94906
Main system: xR-Leap
SMIF System: LPT 2200
Hardware configuration: NOVAPURE Effluent gas scrubber EGS-237
Automated control system
MOTOROLA 68040 Processor (VME) with fiber optic isolation
Automatic recipe controlled: 0°-7° (Tilt operation)
IHC Source (Module and control)
Leap II Beamline
HDPFS
Tetrode extraction assembly
Dual extraction PSU
Ion source with G2 extraction
Leap II control chassis and leap II beam stop
Dual range analyzer mag PSU
Leap II source chamber exit aperture
Wafer orienter: Notched wafers
Low metal contamination
Silicon coated spoke process wheel with active wafer cooling
Vacuum load lock compatible with robotic loading systems
Automated cassette - cassette handling with slot integrity ((3) Cassette trays, 8")
(2) Light-pens, 17" SONY color terminals
Closed loop Dl water cooling system
Cryo compressors located remotely
Mains matching transformer
Rear cyro pump lift
Peek scan cover
Arm position sensor kit
Wafer handling and wheel, 8"
4 Position SDS gas box
CT 110" Onboard cryos with CTI 9600 compressors
LEYBOLD Turbo pumps
SECS II Host computer interface
Cooling system: Heat exchanger / Closed loop de-ionized water cooling system
Wafer loader: (3) Carousel paddles
Wafer orients: Batch notch orient
Wheel chamber: (17) Heat sinks, 8"
Control system: Fiber optic communication network
Control module: VME Microprocessor
Plasma flood gun: HDPFS
Beam line: IHC
Gas panel option: SDS Toxic gas modules for AsH3 and BF3
Tilt: Variable implant angle, ±10°
Hard disk: 4 GB
RAM: 128 MB
CIM Linked
1996 vintage.
AMAT / APPLIED MATERIALS xR80 is an ion implanter and monitor used in the fabrication of semiconductor materials. It is designed to deliver accurate and repeatable ion implantation with a wide variety of substrates ranging from silicon, germanium, and gallium arsenide. AMAT xR80 is a high-precision, high-throughput ion implantation equipment with a high degree of flexibility for accommodating a range of customer applications. The main component of APPLIED MATERIALS XR 80 is its ion source, which is capable of performing both single-beam implantations and multiple-beam implanting operations. This allows users to maximize their ion beam throughput while maintaining a high degree of accuracy and precision. In addition, the ion source has a power range which can reach up to 80kV. With this power range, AMAT XR 80 can implant ions with a very precisely defined energy level. XR80's ion beam delivery system is designed to ensure a high degree of accuracy and precision. This is accomplished through the use of automated beam alignment, spot size adjustment, and laser beam analysis systems. With these features, APPLIED MATERIALS xR80 can maintain a highly accurate spot size and beam alignment, regardless of the substrate materials being implanted. AMAT / APPLIED MATERIALS XR 80 also includes a built-in, sensitive beam current monitor and an ion dose monitor. This allows users to monitor their ion implantation process in real time, ensuring accuracy and repeatability. XR 80 also comes equipped with a sophisticated safety unit which includes a low energy cutoff, beam-interrupt, and end-of-run alarms to protect both the process and the substrates being implanted. This makes AMAT / APPLIED MATERIALS xR80 an excellent choice for semiconductor manufacturing, as it can provide a safe and controlled environment for implanting ions. In addition, AMAT xR80 comes with an intuitive graphical user interface, making it easy for users to program and maintain the machine. The software allows users to perform quick calculations, optimize recipes, and access related data history. This makes APPLIED MATERIALS XR 80 a very user-friendly tool that can easily be integrated into existing manufacturing processes. All in all, AMAT XR 80 is an excellent choice of ion implanter. With its high degree of accuracy and flexibility, it provides users with a reliable and safe process for fabricating semiconductor materials. Through its intuitive graphical user interface and its powerful safety features, it ensures a high level of repeatability and reliability. Its ability to accommodate a variety of substrates makes it an ideal tool for a range of applications.
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