Used AMAT / APPLIED MATERIALS xR80 #9198969 for sale

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ID: 9198969
Implanter Dual bellows extraction assembly With MRS assembly.
AMAT / APPLIED MATERIALS xR80 ion implanter & monitor is a flexible, reliable and cost effective ion implantation tool that can be used to produce a wide range of semiconductor devices. With its unique combination of high throughput, high accuracy, low cost, and reliable results, AMAT xR80 provides an excellent platform for a variety of manufacturing requirements. APPLIED MATERIALS XR 80's main components are a main unit, an electron gun, a chamber, an evacuation equipment, a control interface, and a particle detector. The main unit of XR 80 consists of a vacuum chamber, and the electron gun. The electron gun is responsible for generating beams of ions that can be obtained and manipulated by the controlled devices inside the chamber. This is done by controlling and varying the energies and depths of the ion beams. The chamber of AMAT / APPLIED MATERIALS XR 80 houses a number of components that are responsible for producing and monitoring the ion beam manipulation. These include electron lenses, a digital controller, an ion monitor detector, and a beam trapping system. All of these components work together to produce a series of highly precise ion beam patterns that can be used to precision-cut and manipulate semiconductor substrates. The evacuation unit is responsible for maintaining the vacuum inside the chamber. The machine is capable of producing a level of vacuum that is necessary for proper operation of APPLIED MATERIALS xR80, and the chamber can be sealed tightly when a substrate is introduced in order to ensure optimal beam manipulation and manipulation results. AMAT XR 80's control interface provides users with a graphical user interface, or GUI, that can be used to monitor beam characteristics, monitor tool performance, and control various aspects of the device's operation. This interface also allows for external monitoring of xR80's operations through measured values, feedback from detectors, and other feedback from computer networks. The particle detector of AMAT / APPLIED MATERIALS xR80 is responsible for detecting the presence of any stray particles that may occur due to irregularities in the ion beam's structure. This is especially important for controlling the ion beam's parameters in critical applications. The detector is capable of detecting beam impurities, small particles, and is also able to identify emission of stray particles. In conclusion, AMAT xR80 ion implanter & monitor is an excellent tool for the production and manipulation of semiconductor devices. Its unique combination of reliable performance, high throughput, and low cost makes it an ideal choice for many manufacturing applications. In addition, the user-friendly control interface, the reliable evacuation asset, and the particle detector make APPLIED MATERIALS XR 80 an excellent addition to any semiconductor production facility.
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