Used VARIAN VIISta 810 HP #9093342 for sale

VARIAN VIISta 810 HP is a high-performance ion implanter and monitor equipment developed by VARIAN Semiconductor Equipment Associates, Inc. The machine was designed to meet the demands of the most advanced semiconductor fabrication process and allow for greater precision and performance in the implantation of ions. The system features a hybrid architecture, which combines a high-voltage, direct-current (DC) ion source device with an integrated wafer reconstituter. The reconstituter helps ensure a constant and constant quality of implanted ions, and allows for the precise control of the dose of ions implanted into the wafer. The ion source device also contains a shielding of both the source and the implant area, allowing for reliable, safe operations. VARIAN VIISTA 810HP has a large, easily readable digital display that provides essential information including implant dose and species, pressure, operating parameters, and unit status. It also has an automatic calibration feature that helps optimize the precision of implantation and ensure that the distribution of ions in the wafer is continuously monitored and kept within specified tolerances. The machine includes a number of ion sources including the high-efficiency ion beam generator, a substrate-supported DC ion source, and a high-voltage, powerful ion beam source. The beam source allows for dramatically improved accuracy and resolution, as well as higher doses and much lower beam loss than before. The tool also features a suite of powerful, asset-level diagnostic tools. These include an integrated beam optical data model that allows for the analysis and display of multiple beam optical parameters, and a Fault Detection and Isolation (FDI) equipment that identifies and isolates faults in the system's operation. The diagnostics results are stored in a secure digital memory for future reference, and provide valuable data for machine upkeep and development. VIISta 810 HP is amongst the most advanced ion implantation solutions on the market, and provides a combination of precision, performance, and safety. By helping to ensure consistent, quality implantation, it helps to maximize yield and reduce costs. It is compact in size, and highly reliable and robust, making it an ideal choice for modern semiconductor fabrication processes.