Used COMMONWEALTH SCIENTIFIC / VEECO N2000 #9044878 for sale

COMMONWEALTH SCIENTIFIC / VEECO N2000
ID: 9044878
HCES Nutralizer P/N: 45086-2 PSU 208/220 V, 50/60 Hz.
COMMONWEALTH SCIENTIFIC / VEECO N2000 ion milling equipment is a state of the art system designed for processing a variety of materials at a high speed. Its sophisticated design enables ion milling of a variety of materials including semiconductors, polymers, metals, plastics and optical materials. The unit is based on a closed-loop etch chamber along with a 30 keV ion source. It has a dual ion source configuration, enabling the use of both gallium (Ga) and argon (Ar) ions as sources. The Ga source is ideal for etching dielectrics in a wide variety of materials, while the Ar source is more suitable for etching metals, semiconducting and polycrystalline films. In addition, the ion source has an adjustable beam current which allows for fine-tuning of milling parameters to optimize processing. VEECO N2000 supports single substrate etch, as well as parallel processing of up to eight substrates simultaneously. It also has an integrated automated substrate metrology machine that monitors critical substrate parameters in-situ. This allows for process monitoring and optimization over the entire etch process. COMMONWEALTH SCIENTIFIC N2000 is also equipped with an integrated gas delivery tool. This asset includes three independent gas lines as well as two strategically located RF and DC plasma sources. This means that N2000 can be used to both mill and clean surfaces with high precision. Finally, COMMONWEALTH SCIENTIFIC / VEECO N2000 comes with a vacuum deposition model, allowing for the deposition of a wide variety of materials. This includes metals, oxides, nitrides, and carbon-based films. The films can be deposited at temperatures as low as 150C, allowing for fine-tuning of the films' properties for optimal processing. Overall, VEECO N2000 is a highly advanced equipment capable of handling a variety of materials with maximum precision. Its integrated automated metrology system, dual ion source configuration, and wide range of deposition capabilities make it a highly reliable and scalable unit for any industrial or commercial application.
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