Used FEI Accura 800 / 986 #9192766 for sale

Manufacturer
FEI
Model
Accura 800 / 986
ID: 9192766
Focused Ion Beam (FIB) system Missing electronics rack.
FEI Accura 800 / 986 Ion Milling System is a powerful, versatile, and versatile device designed to produce sub-micron features from a variety of materials. This system is air or vacuum compatible, with a wide range of beam energy and dosage variables. It has a sampling capability of up to 6 mm2 in 6 different orientation angles, giving it a high degree of accuracy and a wide range of applications. FEI Accura has a unique ion milling chamber with a gas ionized source in the back and a sputtering gun at the front. The sputtering gun is designed with four nozzles, which allow for varying angle sputtering to fine-tune the process. It is connected to a digital data processor, which enables to set accurate parameters and to monitor the process in real-time. The ion milling process is capable of machining sub-micron features with high resolution. It works by ionizing a gas and sending the gas ions inside a milling chamber. This chamber is filled with target material to be milled. The gas ions interact with the material, sputtering away high-resolution features. FEI Accura is capable of working in both dry and wet processing modes. In dry processing, the gas ions are accelerated towards the target material, creating high-resolution features without additional liquids. In wet processing mode, the gas ions are combined with a liquid electrolyte to further support the highly delicate machining operations. FEI Accura is designed to perform rapid processing with a high level of accuracy. It can be used to produce precise nanometer features, down to 0.15 nm, and patterned features down to 0.25 microns. It offers variable beam energy ranging from 50 to 500 keV to provide higher quality machining without damaging delicate substrates. FEI Accura is an effective tool for a wide range of applications. This system is used for micro-machining, fine sample preparation, sample preparation for X-ray diffraction, sample characterization, micro-etching, nano-patterning, and sub-micron processing. It is an excellent choice for many research laboratories and companies looking for high-precision machining, rapid processing, and excellent quality results.
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