Used FEI Helios NanoLab 400 #9194575 for sale

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Manufacturer
FEI
Model
Helios NanoLab 400
ID: 9194575
Vintage: 2007
Focused Ion Beam (FIB) system Detectors: Through-lens (TLD) Dual beam Accessories: OMNIPROBE Manipulator Gas Injection System (GIS) PT & TEOS Enhance etch (IODINE) AutoTEM G2 No STEM detector / STEM Capability 2007 vintage.
FEI Helios NanoLab 400 is a multi-functional ion milling equipment that provides high-resolution, 3-dimensional surface analysis and precise sample preparation. The high-performance system offers variable chamber pressure, high deposition rates, and superior ion milling capabilities. This allows researchers to obtain reproducible, precise nanometer-scale depth profiling and surface preparation for a variety of applications. Helios NanoLab 400 milling unit is composed of an ion source, a scanning electron microscope (SEM), a high-vacuum chamber, and an elaborate computer control machine. The ion source produces a high-energy beam of atomic-size particles that are then directed to the sample. In the SEM, the beam is used toetect the shape, size, and chemical composition of the sample. The high-vacuum chamber isolates the sample from external environmental influences. The Helios Nanolab is designed to deliver precise, repeatable, and controlled remove and deposition processes to prepare various samples. Its advanced features include a pulsed polishing tool, a dual ion beam asset, and a multi-dimensional scan. The separable ion beams help to precisely control both the range and depth of etching and sputtering. The multi-dimensional scan ensures that the sample can be inspected on a variety of levels, from topography to elemental composition. In addition, the model can perform high-resolution imaging, chemical characterization, depth profiling, and cross-sectional analysis of the surface structures of materials and devices. FEI Helios NanoLab 400 is also equipped with a range of advanced ion etching sources, such as thermal, chemical, and mechanical sources. This allows researchers to make precise modifications to the sample surface to facilitate nanofabrication and create complex 3-dimensional structures. Helios NanoLab 400's adjustable chamber pressure also supports various processes, allowing researchers to achieve optimal results for a wide range of samples. Furthermore, the dual-level vacuum chamber increases the equipment's sample preparation time by eliminating multiple chamber breaks to prepare samples for further inspection. Thanks to the dual-level chamber pressure, the sample preparation process can be performed at high accuracy and efficiency. FEI Helios NanoLab 400's unique design, high-precision engineering, and sophisticated computer control system offer a powerful and versatile tool for researchers searching for a reliable, easy to operate, and advanced surface analysis and preparation unit.
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