Used FEI / MICRION 9500 #9145594 for sale

FEI / MICRION 9500 is an ion milling system designed to provide superior precision materials modification and thin film removal. The system is comprised of several components including an electron column, ion miller head, and two load lock systems, all of which are controlled through a user-friendly graphical interface. The electron column is used to focus the beam of ions onto the specimen, the ion miller head is used to contain and control the ion beam, and the two load lock systems are used to introduce and remove samples from the machine. FEI 9500 boasts an impressive array of features, allowing the user to easily modify and remove material from samples. It can produce a focused beam of ions with up to 40 kiloelectron volts of kinetic energy, enabling precise and rapid material removal. The beam intensity can be adjusted from 5 to 40 keV to tailor machining to different types of samples. The electron column has a 3-axis control, allowing the user to reposition the beam to target any specific area of the specimen. MICRION 9500 is capable of producing a wide range of pattern sizes from 0.2 µm to 25 µm. It is also capable of removing a variety of materials, ranging from insulators to conductors, and even metals. The precision and accuracy of material removal and modification are further enhanced by the adjustable current range (from 0.5 to 50 milliamps) and adjustable scan speed (up to 200 micron/hour). The two load locks on 9500 are designed for easy specimen handling, allowing the user to easily insert and remove samples for processing. The environment in the two load locks can be controlled, providing a vacuum-safe environment for samples and protecting them from thermal and air-borne contamination. FEI / MICRION 9500 is designed for user-friendly operation, with a simple graphical interface and diagnostic LED display. It is also designed for optimum stability and reliability, featuring a self-centering gimbal, an armless self-contained design, and an internal purge gas system. This makes the device well suited for numerous research and industrial applications such as circuit modification, device fabrication, and thin film removal.