Used PHILIPS / FEI Strata 400S #9202026 for sale

PHILIPS / FEI Strata 400S is a low-cost, low-vacuum, wide-area ion milling equipment designed to prepare flat, conductive specimen surfaces for specimen examination. FEI Strata 400S system delivers a high rate of focused ion beam power, excellent low-vacuum compatibility, and large field of view. It is suitable for a variety of applications, such as the surface preparation and analysis of semiconductor devices, metallography, crystallography, and thin film metrology. PHILIPS STRATA400S features a 400mm beam aperture and is capable of providing up to 900 Watts of focused ion beam power. To ensure the precise polishing of a specimen's surface, FEI STRATA400S can adjust the beam size to ensure the optimum level of ion beam power and uniformity in the polishing area. The depth of penetration achieved is also adjustable by controlling the ion beam current and acceleration voltage. PHILIPS Strata 400S is a dual-stage ion source, which allows for the polishing of both the surface of a specimen and the underlying structure. This versatility makes STRATA400S ideal for the preparation and analysis of semiconductor devices with multiple layers such as thin-film gate structures and complex 3D features. In addition, PHILIPS / FEI STRATA400S can generate different working loads to ensure the quality of the polished surface and the performance of the device. Strata 400S features a specially designed filtration unit which removes particles from the chamber's environment, minimizing their influence on the sample and the stability of the ion beam. Additionally, PHILIPS / FEI Strata 400S features a double-filtering machine to eliminate undesired aberrations. Also, FEI Strata 400S's low-vacuum compatibility allows for the safe processing of specimen without damaging its environment. In conclusion, PHILIPS STRATA400S is a robust, low-vacuum, wide-area ion milling tool capable of providing precise specimen surface preparation and analysis for a variety of applications. It offers excellent beam control, reliable filtration asset, and adjustable working load for optimal results.