Used PHILIPS / FEI Strata DB235 #9202056 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9202056
Dual beam FIB / SEM System E-Beam imaging resolution: <2.5 nm I-Beam imaging resolution: ~ 7 nm (3) Gas injection systems (GIS) for material deposition: Pt, carbon, selective carbon mill E-Gun type: Sirion SFEG I-Gun type: Magnum (2) Resolution modes: Search mode UHR (Ultra high resolution) Mode with immersion lens Detectors & imaging modes: SED (Everhart thornley) (ETD) Through the lens detector (TLD) TLD-S (Secondary electron imaging) TLD-B (Back scattered electron imaging) TLD-C (Charge reduction) TLD-D (Down hole) Motor stage: 50 mm x 50 mm Model 100.5 omni probe TMP Operating system: Windows XP Upgraded with: HT Gun cable XEI Plasma cleaner Computer OL Pole piece 2015 Main power supply (SMPS).
PHILIPS / FEI Strata DB235 ion milling equipment is a powerful and versatile tool designed for physical etching of a variety of conductive substrates. It works by bombarding the chosen substrate with a beam of focused ions at high energies to remove material from the surface with precision and accuracy. FEI Strata DB235 is constructed mainly from a stainless steel chamber and electronics cabinet. Inside the chamber is an ion source which is responsible for the generation of the ion beam which will physically etch the surface of the substrate. The substrate is placed on the sample stage, which is typically made of stainless steel or titanium. The sample stage can be positioned using a three-axis precision controller with a resolution of 0.1µm to allow for precise positioning. The ion source is equipped with a set of lenses which focus the ion beam into a narrow spot of a predetermined size on the sample surface in order to facilitate the etching process. In addition to the main components mentioned above, PHILIPS STRATA DB 235 is also equipped with numerous other features designed to improve the precision of the etching process. These include a fast switching electron beam which rapidly directs ions and electrons onto the sample surface in order to effectively mask physical defects. It also includes an adjustable power supply, allowing the current to be set optimally for each material. STRATA DB 235 is compatible with a wide range of substrates such as metals, oxides, polymers, and semiconductors. It is capable of etching up to 150mm diameter sample surfaces with a spot size of 1µm. It is capable of etching with an accuracy of 0.1µm and at a repeatability of 0.02µm. The system is managed by a powerful control unit, which allows operators to easily program the machine and monitor the milling process. It also provides advanced tools for process optimization and troubleshooting. Strata DB235 is a robust and reliable machine which is highly suitable for a range of etching applications. It provides a high level of precision and accuracy while remaining easy to use. The wide range of compatibility with substrates and its advanced features make PHILIPS / FEI STRATA DB 235 an ideal choice for researchers in various fields.
There are no reviews yet