Used FEI Vectra 986+ #9192666 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
FEI
Model
Vectra 986+
ID: 9192666
Vintage: 2003
Focused ion beam system Upgraded to IET on 2006 Operating systems: Unix / Linux Ion mill column / Next gen column: 5nm Laser interferometer stage Gases: Chlorine Xenon diflouride Siloxane (TMCTS) or (Tetramethylcyclotetrasiloxane) Oxygen H2O Tungsten IR Camera included 2003 vintage.
FEI Vectra 986+ is a state-of-the-art ion milling equipment designed for advanced material microstructural characterization. It employs a focused ion beam column which can mill away minute subsurface layers from the sample material to expose a desired area of subsurface microstructural material for further detailed analysis. Vectra 986+ ion milling system utilizes a 40 keV DualBeamTM Gallium (Ga+) bombardment source that can mill sufficiently deep into a wide range of sample materials with very high accuracy and minimal sample damage. The unit is equipped with a powerful X-MaxTM optical microscope for increased resolution and imaging capabilities. Additionally, optional accessories allow for the machine to be extended for simulation, 3D imaging, nanofabrication, and analytical applications. FEI Vectra 986+ offers a variety of sample handling platforms for sample mounting, ranging from a manually operated 6-position sample loading tool to an automated 40-position sample loading station. This allows users to quickly switch between subsurface sample preparation and nanofabrication of complex 3D structures. Vectra 986+ has a process control integrated software package, which allows users to manage various parameters of the ion milling process, including acceleration voltage and beam current used by the asset, and to generate complex trajectories for additive/fabrication processes. Additionally, the model provides environmental isolation and protection against any airborne contaminants, to ensure a clean and safe working environment. The equipment supports both 2D and 3D models of sample morphology, making the system very versatile and efficient. Furthermore, the advanced image processing and analysis capabilities of the unit can be used to detect the presence of sub-surface materials and to make detailed measurements of their dimensions, optical characteristics, and microstructural properties. The high performance and versatility of FEI Vectra 986+ make it an ideal tool for a wide variety of research and industrial applications. It is particularly useful for material characterization of semiconductors, metals, polymers, and fibers, as well as for micro- and nanofabrication and nanoanalytics.
There are no reviews yet