Used ABM Custom #9111321 for sale

Manufacturer
ABM
Model
Custom
ID: 9111321
Wafer Size: 8"
Mask aligner, 8" Zeiss high resolution mask alignment microscope 500 Watt UV power supply Top and backside alignment Table-top configuration Adjustable vacuum contact Precision alignment module for piece parts up to 8" Square, .005" to .3" Thick Top (2" to 10") and Bottom (2" to 8") vacuum mask holders Fixed level or Wedge compensation vacuum chucks Uniform / Collimated exposure beams, Near UV, Mid UV, Deep UV 2-Channel 200 To 2,000 Watt intensity controlling power supplies Splitfield CCD/TV alignment systems / microscopes Single Field Zoom & High Magnification Microscopes Standard support and vibration isolation tables.
ABM Custom is an extremely precise mask aligner designed for semiconductor device fabrication applications. It is equipped with a suite of advanced optics and imaging components that enable the precise location of masks for the fabrication of the most challenging layer designs. This tool is specifically designed for Custom mask layout needs, such as Ultra-Thin Hard Mask and Polyimide applications, as well as advanced Flip Chip and Fan Out applications. ABM Custom features a 3-axis positioning equipment with extremely high accuracy and repeatability. This positioning system ensures that masks are accurately located to the surface of the wafer. It is also equipped with an automated vision alignment unit that compensates for any distortions or misalignments in the mask position. The machine is capable of fast, accurate, and repeatable mask alignment to the wafer surface even while working with challenging geometries. Custom also utilizes specialized image processing algorithms to achieve high resolution and throughput for image alignment. It uses sophisticated image analysis algorithms to correct for any peripheral distortions, allowing for a consistent alignment of masks on the wafer. Additionally, ABM Custom allows for complex optimization of the exposure parameters, including adjustment of the pitch, offsets, and auto exposure levels. The tool also includes an auto-correction algorithm for fine-tuned optimization of the exposure settings. This ensures that masks are accurately and consistently aligned regardless of the complexity of the layer design. Custom is a precise and reliable mask aligner designed for ABM Custom mask layout needs. Its high accuracy and repeatability provide an excellent solution for a wide range of layer fabrication applications, from Ultra-Thin Hard Mask and Polyimide applications to advanced Flip Chip and Fan Out applications. Its image processing algorithms and integrated optimization parameters enable reliable alignment of masks, resulting in an efficient and cost-effective mask aligner.
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