Used BSL / BETA SQUARED LITHOGRAPHY Micralign #9149904 for sale

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BSL / BETA SQUARED LITHOGRAPHY Micralign
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ID: 9149904
Projection mask aligner.
BSL / BETA SQUARED LITHOGRAPHY Micralign is an advanced mask aligner designed to meet the challenges of modern semiconductor device fabrication. Its compact design, robust performance and easy-to-use user interface make it an ideal solution for film and lithography based technologies. The main feature of this device is its alignment accuracy, offering results with sub-micron resolution. In alignment, the system utilizes dual focusing lenses that produce a focus plane perpendicular to the wafer's axis and a field of view equal to the wafer size. This helps to ensure the highest precision in alignment and registration. In addition, its motorized XY stage with an accuracy of 0.1mm ensures a high performance in registering small geometries, such as bond pads, contacts and lines. BSL Micralign also features beam modulation features to reduce exposure errors and the need for a separate shutter. This allows for a much faster exposure time, reducing risk of long exposure hot and cold spots. Furthermore, its dynamic reticle position measurement ensures accuracy in reticle placement, compensating for any movement in the mask. The device also features a quartz lamp monitoring system that monitors lamp intensity to minimize exposure variation between process steps. The lamp can be automatically adjusted to its best exposure level for each process condition. It also includes an automatic flattener that compensates for any surface irregularity, providing a uniform flatfield and reducing distortion. Finally, BETA SQUARED LITHOGRAPHY Micralign is designed with a range of safety features, such as emergency stop, laser lockout, and electromagnetic field protection. The system also comes with user data protection, allowing for secure storage and processing of sensitive user data. Overall, Micralign is an advanced mask aligner that provides high precision, accuracy, and repeatability for semiconductor device fabrication. Its compact size, robust design and easy user interface make it an ideal solution for film and lithography based technologies.
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