Used CANON MPA 3000W #9195378 for sale

CANON MPA 3000W Mask Aligner is a high-precision, fully automated wafer-level Patterning Semiconductor Fabrication Equipment. It is capable of imaging feature sizes as small as 1 micron, making it ideal for the production of highly complex microprocessors, display panels, and other devices. The system's unique optical design includes a specialized optical lens, which allows for maximum lighting efficiency and makes fine feature metrology possible. CANON MPA-3000 W is exceptionally stable, working within a thermal operating range of 10 to 30°C with a maximum throughput of 4,000 wafers per hour. In order to ensure uniform exposures and to reduce backslide and flare, the key components of MPA 3000W are enclosed within its N2-enclosed Imaging Chamber. Proximity and Focus Detection sensors monitor the gap between the mask and the wafer during exposure, allowing for accurate alignment. Its Ion Pump vacuum chamber further contributes to the accuracy of MPA-3000 W, by creating a vacuum in the area between the photomask and the wafer. This vacuum prevents undesired oxygen absorption on the wafer's surface, ensuring a uniform exposure across the wafer. By optimizing the Mask Aligner unit using its automatic calibration mechanism, CANON MPA 3000W can compensate for geometric distortion and temperature changes during exposure. This helps to reduce process variation and improve process stability. Its Wafer Changer also helps to reduce backslide and standoffs, and its automated Wafer Transport Mechanism ensures smooth and secure wafer handling. Furthermore, CANON MPA-3000 W's advanced X-Ray source ensures consistent beam size, allowing for uniform exposure parameters. To ensure repeatable and reliable results, MPA 3000W employs several advanced features. Its Single-shot Compression and Uniform Exposure Parameter technologies help to minimize standing wave and shadowing effects, while its advanced Exposure Source provides a homogenous dose distribution across the wafer. Its Fault Detection Mode also monitors the exposure process, allowing for quick and efficient detection of any problems that may arise. MPA-3000 W is an ideal machine for the fabrication of highly precise microprocessors, display panels, and other devices. With its advanced optical and triggering technologies, CANON MPA 3000W ensures repeatable results and consistently high throughput.