Used CANON MPA 3000W #9196898 for sale

CANON MPA 3000W Mask Aligner is a high-precision and advanced device designed for the production of semiconductor devices. It is capable of exposure processes that require precision up to sub-micron levels. Compatible for 6 inch and 8 inch wafer sizes, the machine's maximum number of lead frames is one thousand, and its alignment accuracy is two to eight microns. The machine has a state-of-the-art design, which is highly efficient and produces fast cycle times. It is equipped with a high-speed mechanical marking equipment with both position and displacement nodes. The exposure system is composed of full telecentric optics and a semiconductor laser. The object to be exposed is placed on an X-Y positioner, and a reticle mask is placed into the optical unit to align the micron pattern on the reticle to the corresponding pattern on the wafer. CANON MPA-3000 W also has several features designed to help maximize performance and enhance accuracy. These include touch screen control that allows users to program wafer and reticle coordinates, as well as programmable exposure angles. The wafer stage has an open-closed support machine to ensure stable surface viewing and improved wafer air flow. The scanner support has an independent vacuum control tool that directs the scanning mechanism and contains an adjustable pitch. In addition, MPA 3000W has a temperature controlled gas circulation chamber, which is designed to minimize the effect of temperature changes and maintain a consistent atmosphere throughout the exposure process. The camera asset employs a programmable shutter model and a direct image data transfer function, which allow users to verify the alignment results before proceeding with the exposure process. Overall, MPA-3000 W Mask Aligner is a technical device of astounding capabilities and reliability. Its fast cycle times and precision up to sub-micron levels make it an ideal choice for advanced semiconductor device production. Its numerous features and functions help it meet all sorts of research and production needs, so that users can always achieve the best possible results.