Used CANON MPA 600 Plus #9192664 for sale

CANON MPA 600 Plus mask aligner is a professional-grade photolithography solution designed specifically to meet the needs of semiconductor device fabrication. The tool provides fast patterning with features for high precision alignment and overlay. With maximum throughput capabilities and a wide range of exposure times, MPA 600 Plus provides an ideal platform for fabricating complex integrated circuit devices. CANON MPA 600 Plus equipment comprises a mainframe, a mask stage, a wafer stage, a reticle stage, and a drive system. The mainframe houses the unit's electronic subsystems such as the high-resolution imaging machine, wafer handling hardware, software control, and various output systems. The mask stage provides precise alignment of the reticle stage and features an eight-node calibration for superior accuracy. The wafer stage permits variable-speed operation, automated height tracking, and tool-accurate zooming. The reticle stage features an ultra-high-resolution sensor for precise alignment of the mask and wafer. The drive tool provides the power to all components within the asset. MPA 600 Plus features high-resolution imaging capabilities, advanced exposure management, and an intuitive user interface. The model also offers a host of optional features such as automated wafer handling, high-speed focusing, and auto-exposure control. The device is also capable of multiple operations including lithography, metrology, and deposition. CANON MPA 600 Plus is compatible with a range of substrates, from low-cost CMOS substrates to ultra-high-speed gallium arsenide. All of the features—optimal mask alignment, automated process control, fast throughput, and precise imaging—allow MPA 600 Plus to accommodate the fabrications of the most complex integrated circuits. CANON MPA 600 Plus also offers a variety of safety protocols, including safety camera monitoring, a safety exit, emergency stop systems, and secure chambers. This ensures that all operations are conducted in a safe and secure environment, and that the equipment remains in compliance with OSHA standards. Overall, MPA 600 Plus is an innovative and powerful photolithography system. The device is designed for maximum throughput, accuracy, and safety, and is capable of handling the most intricate and complex substrate designs. The unit is an invaluable tool for semiconductor device manufacturing, as it greatly reduces the process time and increases the accuracy and reliability of the integrated circuits.