Used CANON PLA 501 #9198592 for sale

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Manufacturer
CANON
Model
PLA 501
ID: 9198592
Wafer Size: 3"
Mask aligner, 3".
CANON PLA 501 is a precision mask aligner for photolithography processes used in the production of microelectronic devices. This mask aligner has a fast scanning rate and a high level of accuracy, allowing precise lithography of integrated circuit wafers. It has an exposure wavelength of 248nm, and can be easily configured for other wavelengths. The optical equipment is designed to provide stable focus and imaging performance. CANON PLA-501 has a residence area of 4-inch, with a resolution capability of 0.2 microns. The alignment and lithography accuracy is maintained at 0.1 microns. The scan modes include single, long and fixed field scanning. The aligner can be optimized with a patented pattern matching system. The exposure head enables stepper control and yields superior performance. It has high speed processing capability of up to 50 cycles per minute, with an aerial image SNR of better than 40 dB for high quality processing. The optional substrate translation stage unit allows for rapidly changing between different exposures, enabling higher throughput at high accuracy. The mask aligner is equipped with a temperature control machine to stabilize temperature for long exposures. The precise temperature and humidity control improves exposure and consistently maintains the highest accuracy. PLA 501 also offers FPD (Flat Panel Display) systems such as LCDs and LED, which are more efficient and lighter weight than other display technologies. This alignment tool is also able to reduce distortions due to reflections and/or air bubbles in highly reflective surfaces. The powerful software driving PLA-501 mask aligner provides user-friendly control of the asset settings and parameters. In addition, the model is equipped with a wide range of advanced functions to meet the requirements of high volume production. Overall, CANON PLA 501 is a robust mask aligner that is reliable and easy to use. It is capable of producing high quality integrated circuits with high accuracy. This advanced photo-lithographic tool is an ideal choice for the production of display panels, semiconductors and microelectronic devices.
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