Used CANON PLA 501 F #9198627 for sale

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CANON PLA 501 F
Sold
Manufacturer
CANON
Model
PLA 501 F
ID: 9198627
Aligner With stripped spare parts.
CANON PLA 501 F is a state-of-the-art mask aligner used in the semiconductor industry for photolithography applications. It utilizes step and repeat imaging, with precision microstepping, to provide submicron resolution. The 501F's slow-motion work table enables users to accurately place and align photomasks on top of semiconductor wafers. It is equipped with a 6-axis motion control system that ensures optimal scanning accuracy and repeatability. Additionally, the high speed shutter projector enables fast and accurate placement of photomasks. The 501F has a wide exposure range (and therefore supports a variety of source wafers and photomasks). It also supports both step & repeat imaging (with a full field image) as well as variable length serial imaging (for smaller, high-density field images). The mask aligner is also capable of high precision reticule alignment for accurate positioning of photomasks and wafers. CANON PLA-501F has a wide range of safety features built in, including automatic vacuum interlock, which ensures that the operator will be safe during the mask aligning process. Additionally, the device is equipped with multiple emergency switches to allow the operator to shut off power to the system in the event of an emergency. The 501F also has a user-friendly interface that allows for the creation and modification of mask layout files. The intuitive software program allows operators to quickly and easily define custom mask parameters, such as field size, exposure levels, and focus range. This helps optimize performance and increases productivity. Overall, PLA 501F is a state-of-the-art mask aligner that offers a wide range of features that make it an ideal choice for the semiconductor industry. It offers superior scanning accuracy and repeatability, as well as a variety of safety features. The intuitive software program simplifies operation and helps increase productivity. Ultimately, the 501F offers an optimized solution for photolithography applications.
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