Used CANON PLA 501 FA #9190949 for sale

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CANON PLA 501 FA
Sold
Manufacturer
CANON
Model
PLA 501 FA
ID: 9190949
Wafer Size: 5"
Mask aligner, 5".
CANON PLA 501 FA is a high precision mask aligner designed for the production of microelectronic devices and other photolithography applications. It is powered by an advanced nanopositioning system and high-resolution stepper motors, which allow to rapidly and accurately align photolithography masks to the substrate. The aligner features high alignment accuracy, with the ability to register to +/-2µm or better in both x and y directions. CANON PLA-501FA is equipped with a 5" stage which is quiet and fast at moving. It can support a substrate size up to 6", and comes with an automated substrate loader. It has a total field of view of 5.12", which gives it an impressive field of view both for alignment and exposure. The field of view is complemented by a read-out accuracy of 0.01µm. PLA 501FA has a through-the-lens optical system that allows for non-contact, contact, and interference alignment. This allows for accurate alignment even when there is a difference between mask and wafer sizes, as well as variable substrate thicknesses. PLA-501FA offers optimized illumination systems that deliver an omni-directional, low intensity light source, or a highly concentrated spot, depending on the application. This allows for better illumination of the substrate and mask and improved alignment accuracy. Additionally, the mask aligner features an automated mask shifting system that helps to reduce macular alignment errors that can occur during exposure operations. CANON PLA-501 FA is also equipped with a patented re-align technology that enables the alignment image to be stored for later use, making it easy to repeat alignment. This feature also eliminates the need for manual alignment set-ups. Lastly, the mask aligner also has a number of accessories available, including a high-performance platform and additional illuminators. Overall, PLA 501 FA is a reliable, high-precision mask aligner that makes microelectronics production considerably more efficient and accurate. It offers advanced features such as optical alignment, automated substrate loading, optimized illumination systems, and re-align technology, making it a great option for photolithography operations.
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