Used KARL SUSS / MICROTEC MA 200 #9180516 for sale

KARL SUSS / MICROTEC MA 200 is a mask aligner that is designed to provide a quick and highly accurate means of transferring mask patterns to the substrates used in microchip fabrication. It uses extreme ultraviolet (EUV) light to create an exposure onto a semiconductor substrate, which is then developed, imaged and tested. MICROTEC MA200 is well-suited for production runs needing high accuracy and short cycle times, especially in processing devices with complex geometries or high densities. The equipment offers excellent submicron alignment accuracy, which is enhanced by the ability to use multiple exposure tool heads. KARL SUSS MA-200 is controlled by PC-based software, enabling users to store, edit, and repeat process steps and alignments. The Mask Aligner utilizes a visual step for exact alignment of the mask onto the wafer, which helps to reduce misalignments. The system also provides repeatable data for each layer, making it easy to fine-tune process steps and improve results each time. KARL SUSS / MICROTEC MA-200 includes features such as a high-speed mask transfer mechanism, a differential focus feedback mechanism for precise focus control, a high-resolution image viewer, and an intuitive graphical user interface. The unit is designed for easy maintenance, with redundant, plug-in components that can be replaced quickly. It also includes an advanced safety machine that monitors and controls operability, and a built-in software error-checking feature to detect any errors that may occur during operation. All safety interlocks are monitored and integrated for efficient and safe operation. MA200 is a reliable and efficient mask aligner that enables the quick and precise transfer of patterns to surfaces used in microchip manufacturing processes. It offers a highly accurate and repeatable process, as well as features such as automatic focus control, a high-resolution viewer, and an intuitive user interface which assist in the production of high quality microchips.