Used KARL SUSS / MICROTEC MA 200 CC #9182471 for sale

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ID: 9182471
Wafer Size: 6"-8"
Vintage: 1995
Proximity aligner, 6"-8" 1995 vintage.
KARL SUSS / MICROTEC MA 200 CC Mask Aligner is an automated lithography system used to transfer patterns from photomasks to wafers. It is typically used in the fabrication of semiconductor devices and other microelectromechanical devices. MICROTEC MA 200CC is a cost-effective solution for applications in which high accuracy and repeatability are essential. KARL SUSS MA-200 CC is built around several key components, such as a micro-resonant (MR) stage which provides precise and repeatable alignment of the photomask over the wafer. The MR stage is coupled to a piezo-based alignment system which provides sub-micron vertical and lateral positioning accuracy of the mask relative to the wafer. Additionally, KARL SUSS MA 200 CC utilizes a high-throughput, high-resolution 6" stepper which provides an optical throughput of up to 340 µm/sec and an alignment accuracy of ±1µm in X, Y and Θ. In operation, a photomask is loaded onto the MR stage, and then brought into close proximity to the wafer. The photomask and wafer are then optically aligned with reference to the reticle marking and a cool white LED. This alignment is performed using a three-camera method before the alignment and exposure of the wafer. After alignment is complete, the wafer is exposed and then the MR stage is moved to the next exposure position. When all the exposures are complete, the photomask is unloaded and a new photomask is loaded for further exposures. In addition to this conventional lithography process, KARL SUSS MA 200CC includes an automated protocol for aligning and exposing multiple wafers simultaneously to maximize productivity. MA 200 CC offers a variety of features which make it an essential tool in the production of semiconductor devices. It offers a resolution of 0.5 μm to 10 μm, and can expose various substrate materials such as polymers and hybrids. Additionally, it is competitively priced, as well as being able to be adapted for a variety of process steps and materials. MICROTEC MA-200 CC is a versatile and reliable tool that can meet the tough requirements of fabrication of high-value microelectronic devices. As a result, it has become an essential component of any lithography laboratory for fabricating complex micro devices.
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