Used M & R NANO TECHNOLOGY AG359-6N-D-S-S-V #9191076 for sale

M & R NANO TECHNOLOGY AG359-6N-D-S-S-V is a high performance mask aligner that is used for the production of large quantities of semiconductor products with a high degree of accuracy. This mask aligner is specifically designed for industry-leading process flexibility and production scalability. It offers a wide range of alignment and exposure capabilities that can be used in a variety of semiconductor technologies including active layer patterns, interconnect structures, and device level metallization. In terms of its design, the NANO TECHNOLOGY AG359-6N-D-S-S-V is equipped with a 3-stage wide-field lenses and wafer-alignment systems that guarantee high accuracy and throughput. These adjustment systems make it possible to fine-tune the alignment of each exposure job for products of any size. In addition, the mask aligner has a large partitioned structure for wafer storage and transfer, which helps to provide a safe and efficient production process. The NANO TECHNOLOGY M & R NANO TECHNOLOGY AG359-6N-D-S-S-V also comes with a swivelling mask unit that ensures precise directional alignment and exposure of the mask. This unit can be programmed for precise positioning and can be used to vary the exposure settings for different types of wafers. Additionally, it also has a pre-programmed resolution and accuracy program that ensures that each exposure is correctly done. The NANO TECHNOLOGY AG359-6N-D-S-S-V is also equipped with an automated mask preparation system that provides efficient vacuum and gas delivery to passivation layers for the deposition of resists. This system also allows for a range of tasks such as photomask cleaning and mask transfer for improved accuracy. The NANO TECHNOLOGY M & R NANO TECHNOLOGY AG359-6N-D-S-S-V also comes with a high precision air gap controlling system that allows the exposure of critical layer features. This enables better process control and helps to ensure the quality of large-scale wafer fabrication. Overall, AG359-6N-D-S-S-V is an ideal solution for the production of high-end semiconductor products. From its design features and adjustment capabilities to its automated mask preparation systems and air gap control systems, this mask aligner ensures highly accurate and repeatable exposure results. As a result, it is a valuable resource for any modern semiconductor processing facility.