Used SVG / PERKIN ELMER / ASML M 761 #9072094 for sale
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ID: 9072094
Wafer Size: 6"
Mask aligner, 6"
Wafer type: Semi flat
Cassettes: Fluoroware
Version dash -003
Auto-fine-alignment (AFA)
Automatic variable magnification (AVM)
Alarm and signal tower
Auto-uniformity-slit
Helium management system (HMS)
Aim system
Motorized carousel arm with enhanced control option
Pick and place wafer transport system (PAL)
Mini-mag strong shell
Hardware options:
Aim Computer Type: Pentium (Y2K Compliance)
Power Supply: 230 Vac, 50 Hz, 1 Phase
Fan-coil-unit (FCU): Inlet Air
Automation: Optional.
SVG / PERKIN ELMER / ASML M 761 is a mask aligner that is used to create accurate, high-precision photomasks for microelectronic device production. It is a equipment composed of several modules and components: the mask alignment table, the exposure system, a light source, and a multi-axis control unit. The mask alignment table is designed to provide a solid platform that can be precisely adjusted for both X-Y and sub-micrometer Z-axis movement. It also provides a level of mask placement accuracy that is essential to produce a high-quality photomask. The alignment table is capable of carrying both a mask and a wafer during the alignment process. The exposure machine consists of movable optics, a light source, and a vacuum-sealed chamber. The optics of the tool are used to accurately project the electronic patterns of the mask onto the wafer. The light source for SVG M 761 is an ultra-high-power Xenon lamp, providing bright illumination for the exposure of small-scale patterns. The vacuum-sealed chamber encloses the exposure asset optics to ensure that exposure is not contaminated by dust or contaminants in the environment. The multi-axis control model allows the aligner and exposure equipment to move seamlessly in all directions. Additionally, the control system includes a computer interface that enables easy, user-friendly operation of the unit. The machine has the ability to accurately monitor and control the mask-to-wafer alignment to a precision of sub-micrometer resolution. The combination of these features makes ASML M 761 an essential tool for the fabrication of advanced masks that are used in microelectronic device production. It is capable of producing high-quality photomasks with minimum waste and maximal efficiency. PERKIN ELMER M 761 also provides a high degree of customization and adaptability. It is compatible with a variety of light sources, exposure times, and mask sizes, making it suitable for almost any application. With its ease-of-use and high performance, M 761 is one of the most reliable and proven mask aligners currently available.
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