Used KLA / TENCOR 2401 Viper #9014087 for sale

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ID: 9014087
Vintage: 1999
Automated macro-defect wafer inspection system Brightfield and darkfield inspection Throughput: 80 Wafer/hour Recipe-configurable pass / Fail settings Camera and optics calibration capability Windows NT user interface Hard drive missing Frequency: 50/60 Hz Volts: 100-240 Power: 200-240, Single phase 1999 vintage.
KLA / TENCOR 2401 Viper is a mask and wafer inspection equipment that offers a high level of performance and accuracy. The system is ideal for inspecting both flat wafers, as well as 3D surfaces on masks, reticles, and other contact substrates. KLA 2401 Viper utilizes a high-resolution CCD detector, which allows for the examination of details down to 30 nm pitches. The detector is also capable of capturing a wide range of imaging angles, enabling the unit to acquire high-accuracy feedback from various imaging angles. The Viper illuminator offers a variety of spectrums to capture, including UV, VIS, NIR, and AR. The machine can be configured to use a variety of 4-way filters and lasers, allowing for greater flexibility and control. The Viper is equipped with advanced imaging algorithms and can inspect for both optical and wafer defect kinds, as well as aberrations due to lithography. The Viper provides fast inspection times, typically 1-2 seconds, and can store up to 4000 images for later review. In terms of user interface, TENCOR 2401 Viper has an intuitive GUI that allows users to quickly and efficiently control the tool. The operator panel has 5-keypad buttons that are used for stepwise training and parameter settings. The asset is also equipped with an advanced analysis model that makes it easy to compare images, as well as to store individual images for later review. By combining efficient programming, advanced imaging algorithms, fast imaging times, intuitive user interface, and high-resolution imaging capabilities, 2401 Viper provides reliable and accurate inspection results. The equipment is a cost-effective way to keep close tabs on surface defects in reticles, masks or other contact substrates. This system can be a valuable asset for both commercial and research settings, providing quality control and assurance that can ensure desired product or research results.
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