Used KLA / TENCOR 2401 Viper #9176353 for sale

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ID: 9176353
Vintage: 2001
Macro-defect inspection system Currently stored in cleanroom 2001 vintage.
KLA / TENCOR 2401 Viper is an advanced mask and wafer inspection system used to detect sub-micron particles, defects, and other quality issues with mask and wafer production. It operates using a quartz halogen light source that illuminates the mask and wafer samples, and uses a telecentric optics system to capture high-resolution images. KLA 2401 Viper includes embedded SENTry technology that uses proprietary algorithms to locate particles and defects with a high degree of accuracy and reliability. The system is equipped with powerful software tools that allow the user to easily toggle between different optical configurations, thereby enabling them to analyze different surface and microstructural features at various locations in one inspection. Additional features such as the ability to independently control the optical paths and the zoom settings allow for heightened contrast and detailed monitoring of specific regions of the sample. In addition to particle and defect analysis, TENCOR 2401 Viper is also able to measure various features of the mask and wafer samples. The low-light auto-focus feature generates high-contrast images, giving users the ability to perform accurate measurements of critical sample dimensions with sub-micron precision. This feature also helps reduce the likelihood of false-positives due to object displacement or inconsistent sample surfaces. 2401 Viper offers repeatability, reliability, and enhanced throughput for mask and wafer production. Its intuitive and easy-to-use graphical interface, along with its powerful software and hardware capabilities, make it a valuable inspection solution for a wide range of production facilities.
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