Used KLA / TENCOR 2410 Viper #9136881 for sale

KLA / TENCOR 2410 Viper is a high-speed, automated machine used for mask and wafer inspection. This equipment is designed to provide a cost-effective solution for optical inspection of lithographic masks, wafers, and reticles. KLA 2410 Viper is a modular platform, allowing customers to build their own configuration. It features powerful imaging, sample manipulation, and comprehensive metrology capabilities. TENCOR 2410 Viper system features high-precision automated sample positioning with up to 18-step sample stages. Additionally, it includes an advanced 5-axis XYZ positioning unit which helps ensure accurate and consistent sample placement. The machine also has an integrated imaging tool with up to 8 Megapixels of high-resolution resolution, providing an extremely high level of detail and accuracy. It includes an advanced 320nm light source which is capable of illuminating specimens from various angles, making it ideal for inspecting masks, wafers, and reticles. 2410 Viper also features an Automated Defect Detection (ADD) feature. This allows the asset to automatically detect and classify defects in specimens with an accuracy of up to 99.9%. It allows users to customize inspection recipes for each type of sample, and can even detect and classify complex defects such as scratches and photolithography errors. The model can also be integrated with external metrology systems, allowing for automated 3D analysis of wafers. KLA / TENCOR 2410 Viper is designed with an efficient and reliable design in mind, allowing it to quickly and accurately inspects samples with minimal setup and downtime. A full integration with the other major equipment vendors is supported, allowing for easy setup and integration with other machines and systems. Additionally, KLA 2410 Viper features an easy to use user interface which allows operators to quickly set up and use the equipment. Overall, TENCOR 2410 Viper is a powerful machine which is designed for mask and wafer inspection. It is an ideal cost-effective solution for optical inspection of lithographic masks, wafers, and reticles. It features a modular platform, powerful imaging capabilities, and automated defect detection and classification. Finally, it has an excellent user interface and full integration with the major equipment vendors, making it one of the best mask and wafer inspection systems on the market.