Used LEICA / VISTEC MIS 200 #131981 for sale

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ID: 131981
Wafer inspection system.
LEICA / VISTEC MIS 200 is an innovative mask and wafer inspection equipment designed to provide users with an efficient method of ensuring high-precision performance. This automated system has been designed to optimize the quality of each inspected product, providing accurate and reliable results. The unit comes equipped with two main elements: an imaging subsystem and a pattern recognition subsystem. The imaging subsystem is equipped with automated wafer scanning, advanced pattern recognition, and a high-resolution image scanning machine that can detect even the smallest defects on a wafer. The pattern recognition subsystem includes a powerful software package that is used to identify and evaluate the state of the wafer or mask. This allows the tool to identify imperfections that could potentially impact the performance of the product. The integrated imaging asset further features a color camera, a filter, and an imaging lens that can capture images of both the mask and wafer with extreme precision. The lens performs both in-line and off-line scanning, providing a full-field image of the wafer or mask for maximum accuracy. A user-friendly touch screen also allows for intuitive control of the model. In addition, LEICA MIS 200 is equipped with a pattern recognition function that can identify and distinguish between complex and simple patterns, as well as determine their area coverage. The equipment can accurately measure wafer and mask size, perform defect measurements, and analyze critical dimension and topography measurements. The system's intuitive user interface allows users to quickly set up and run tests, while its smart data analysis allows for easy and rapid data analysis. This allows users to rapidly identify potential problems and take corrective action. VISTEC MIS 200 is ideal for use in manufacturing environments where highest quality and accuracy are essential, as it enables users to quickly and accurately analyze their products for defects. Offering both fast performance and high accuracy, this mask and wafer inspection unit is an essential tool for any modern factory.
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