Used NANOMETRICS NanoSpec AFT 4000 #9024521 for sale

ID: 9024521
Wafer Size: 3"-8"
Film thickness measurement system, 3"-8" Capable of accommodating wafers from 75mm to 200mm Olympus 5x, 10x, and 50xULWD objectives Olympus 10x eyepiece System Computer and Software Visible Single Layer Films: 500 – 50,000A UV Single Layer Films: 25 – 500A Visible Double (Top) Layer Films: 100 – 30,000A Visible Double (Bottom) Layer Films: 500 – 50,000A -Single Layer Thick Films Visible: 4 – 75 um Reflectance Visible: 400 – 850nm Oxide on Poly UV: 150 – 10,000A Oxide on Metal Visible: 3,000 – 20,000A Oxide on Metal UV: 500 – 5,000A Operator Manual and Documentation.
NANOMETRICS NanoSpec AFT 4000 is an advanced mask and wafer inspection equipment, engineered to provide high quality automated testing for semiconductor devices. This system utilizes automated focused ion beam (FIB) technologies to perform both imaging and analysis tasks. This provides an effective means of measuring and analyzing the physical characteristics of masks and wafers, from topography and composition to interconnectivity and lithographic characteristics. NANOMETRICS NANOSPEC / AFT 4000 consists of three main sections. The first is the Inspection Unit, which contains a high-resolution Siemens MAGNA 3-axis detector and a powerful microscope capability. This allows the machine to accurately detect and resolve the smallest of features under magnification. The second is the FIB Source, which utilizes a dual ion source tool. This provides controlled ion doses for accurate imaging and analysis. Lastly, the asset has an integrated Analysis and Review interface. This allows users to easily monitor and assess the results of each test. NanoSpec AFT 4000 has several features that make it unique. First, it has a high throughput stage, allowing multiple mask and wafer sheets to be tested simultaneously with a single pass. This significantly speeds up the process and can reduce turnaround time significantly. Additionally, the model is highly accurate and repeatable, giving users reliable results each time. The equipment also has built-in safety features. These include a vacuum system, which helps prevent contamination, and an anti-static mechanism for reducing the risk of electrical charge build-up. Additionally, the unit is capable of measuring for both topography and composition simultaneously, providing comprehensive results for optimized efficiency. NANOSPEC / AFT 4000 is a versatile and highly customizable machine. As such, it can be configured for multiple applications, including imaging, electro-chemical, deposition, and mask-wafer preparation. It is designed for use in a variety of industries, from integrated circuits to printed circuit boards. It is also able to maintain its accuracy and results even in high-temperature and humidity environments, making it ideal for diverse production environments.
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