Used VARIAN / VEECO GEN II #9205114 for sale

VARIAN / VEECO GEN II is a Molecular Beam Epitaxy (MBE) equipment that provides outstanding performance and versatility for nanoscale material deposition and characterization. MBE utilizes a highly controlled environment to evaporate and deposit thin films of materials with atomic-scale accuracy, making it the preferred technique for fabricating optoelectronic, magnetic, and semiconductor structures. VEECO GEN II MBE system comprises an ultrahigh vacuum chamber and a series of deposition sources which allow for the delivery of materials for thin film deposition. The delivery can be accomplished through thermal evaporation or electron-beam-assisted evaporation, as well as Chemical Beam Epitaxy (CBE) for the growth of complex solutions with multiple elements. High-rate densification can be attained through low energy ion beams, while ultrahigh purity can be achieved through ion bombardment sputtering. VARIAN GEN II is built with a twin source configuration to support the deposition of up to four layer systems. The unit is also powerful enough to accommodate up to six deposition sources, allowing for the deposition of complicated structures. Additionally, the machine includes an automated gas delivery tool, which can be used to add different gases, such as oxygen, nitrogen and carbon, during the deposition process. The powerful control software of GEN II means that it can achieve extremely precise uniformity and control over the deposition process. The control software can program exact parameters for each process, allowing for full control of complex nanostructures. Additionally, it is equipped with a range of advanced in-situ characterization capabilities. This includes an optical spectrometer and quantum efficiency detector that can be used to measure the thickness, composition, and properties of the deposited material. VARIAN / VEECO GEN II is an advanced MBE asset that is ideal for advanced applications such as research and development into optoelectronics, nanoelectronics, nanophotonics, and other fields. This model provides outstanding performance and versatility, enabling the fabrication of precision nanostructures with atomic-scale accuracy.