Used VARIAN / VEECO GENxplor #9211484 for sale

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ID: 9211484
Vintage: 2015
MBE Growth system Vacuum barrier VBC LN2 Piping system included kSA 400 Analytical RHEED system, 6" With k700-12 detector RF Plasma source for nitrogen GENxplor RF Source for nitrogen to change from phosphorus to nitrogen RF Automatic matching unit: Autotuner source N2 - Nitrogen plasma source Auto tuner power option: 110 - 110 VAC (2) Projects: GaP On sapphire (and Si), phosphorus-based red LED application GaN On sapphire MBE Growth chamber / Source flange assembly Includes: Growth chamber with flat seal flange Full panel liquid nitrogen cooled cryoshroud (10) 4.625" CF Effusion cell ports 4.625" x 4.5" Water-cooled source enclosures configured with sources (10) Pneumatic effusion cell shutter ports Shutter assemblies configured with sources Top 21.5" CF Flange: 8" Manipulator port with Z-motion single platen horizontal manipulator stage 3" Single zone substrate heater with non-contact Thermocouple and servo motor control for rotation Capable of 1000°C TIC temperature Capable of up to 60 RPM in either direction DC Power supply 2.75" CF With pneumatically actuated main substrate shutter (2) Liquid nitrogen feedthrus (Female bayonet) (4) 2.75" Effusion cell viewing ports with shutters Integral pumping chamber pumping package: 10" CF Pump port with cryo pump package Includes: 1,500 CTI CT8 Cryo pump VAT Pneumatic gate valve Cryo compressor Helium lines and cold head cables 8" CF Pump port with ion pump package 220 I/s Ion pump with control unit (3) 2.75" CF Ports: Ion gauge and control unit (GRANVILLE PHILLIPS P350) SRS Residual gas analyzer (0-100 amu) Titanium sublimation pump 8" CF Transfer port (Gate valve configured with buffer chamber) 4.5" CF Transfer viewport with manual shutter RHEED Package: Includes: 6" CF With RHEED screen with shutter 2 .75" CF With 15 keV RHEED gun, (staib) controller With beam rocking, beam blanking, power supply 4.5" CF With linear retractable beam flux monitor 4.5" CF Optical port 1802 opposite BFM (blank) (2) 4.5" CF Optical ports 1802 Opposed (blank) Single-body system support frame Integral cooling water manifold Compressed air distribution manifold with pneumatic control circuits (10) of these are for shutters Base flange assembly Includes: (4) 2.75" CF Ports 2.75" Heated viewport with manualsShutter (pyrometer port) BASF Pyrometer package (wavelength to be determined) (3) 2.75" Ports (blank) Effusion cell: (3) 60cc Hot lip single filament effusion cell packages For use with Indium and Gallium Including: 60cc Hot lip effusion cell 60cc Conical PBN crucible Linear-motion Pneumatic shutter with material-specific shutter blade per source Water cooled enclosure per source DC Power supply (2) 60cc Cold lip single filament effusion cell packages for aluminum Including: 60cc Conical PBN crucible Linear-motion Pneumatic shutter with material-specific shutter blade per source Water cooled enclosure per source DC Power supply Valved cracking effusion cell for use with P Includes: 500cc Mark V P valved cracker Linear-motion Pneumatic shutter with material-specific shutter blade per source Automated servo motor control package White zone temperature controller Water cooled enclosure (2) DC Power supplies Phosphorus recovery system package Includes: Phosphorus recovery system package Includes: 830 l/s Mag lev turbo pump with backing pump and controllers LN2 Cryotrap Gate valve Cold cathode gauge 5CC Dopant cell package for Si Includes: 5cc Dopant effusion cell 5cc PBN Crucible Linear-motion Pneumatic shutter with material-specific shutter blade Water cooled enclosure DC Power supply 60cc Single filament effusion cell packages for use with Zn Includes: 60cc Single Filament effusion cell 60cc Conical PBN crucible Linear-motion Pneumatic shutter with material-specific shutter blade per source Water cooled enclosure DC Power supply Transfer with load-lock and buffer modules: Entry / Exit load lock chamber Includes: 8" Quick access door with integral viewport Quartz lamps for heating to 200°C 8" CF Manual VAT gate valve for connection with the buffer chamber 250 l/s Turbo pump package with controller, roughing manifold, Backing scroll pump Convection gauge Ion gauge with control unit Buffer / Preparation chamber assembly Includes: 8" CF Viewports for transfer hand-off Manually driven UHV elevator transfer system (4) Storage shelves o One (1) Magnetically-Coupled Transfer Rod Assembly for use from Buffer Chamber to Growth Chamber 8" CF Pump port with 160 l/s ion pump and control unit 8" CF Manual gate valve (Connect with growth chamber) Ion gauge and control unit (Granville Phillips GP350) System electronics cabinets Includes: Two-bay electronics rack System controller Sixteen-loop PID temperature controller package Power supply: RF Source power supply DC Power module RF Plasma source RF generator RF Power connector option: 120VAC 2015 vintage.
VARIAN / VEECO GENxplor is a molecular beam epitaxy (MBE) equipment designed and manufactured by VEECO, a leading supplier of thin-film deposition systems for the semiconductor industry. The MBE system provides high-resolution, cost-effective thin-film deposition capabilities to enable next-generation semiconductor devices. VEECO GENxplor MBE combines a wide range of advanced process functions with intuitive graphical user interface for total control over material growth, layer properties, and device results. It has an advanced multi-chamber design which allows up to four different depositing materials to be used simultaneously, providing precisely controlled and reproducible layers. It also offers a range of options for process optimization to enable optimized device yields and improved process repeatability. VARIAN GENxplor MBE unit has a 12 source, 2 chamber capability which provides automatic switch between different deposition modes. Its.cghncluded advanced substrate heating, allowing substrate temperatures to be precisely controlled to optimize material properties and process performance. It also has a wide range of optical and electrical monitoring systems which allow real-time monitoring of material deposition and layer growth processes. GENxplor MBE machine utilizes an innovative mechanical shutter technology, which offers precision in controlling chamber exposure times and substrate temperature during deposition processes. This ensures precise repeatable layer thickness and uniformity. It also has a high-performance vacuum pumping tool which offers fast and stable process times and maximizes static vacuum Class I performance. VARIAN / VEECO GENxplor MBE is an advanced and versatile thin-film deposition asset designed to meet device yield and process repeatability requirements. This model offers the benefits of high-resolution, high-precision layer deposition, making it ideal for research and production applications requiring advanced device quality. It is a highly effective and reliable platform for thin-film deposition, providing maximum performance and unmatched process repeatability.
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