Used AMAT / APPLIED MATERIALS Centura Hart AP #9177828 for sale

AMAT / APPLIED MATERIALS Centura Hart AP reactor is a semiconductor etching equipment specifically designed for photoresist ashing and reactive ion etching applications. This chemically inert system offers high throughput and precision for etch selectivity requirements. It is an all-in-one unit, designed to reduce capital and operational costs while increasing accuracy and accuracy. AMAT Centura Hart AP reactor's etching chamber is constructed from aluminum-protected stainless steel, offering maximum strength and long-term durability. The machine's advanced design features a sealed chamber, two-ended electrode, and adjustable electrode spacing. Together these features allow for a uniform etching process, with adjustable gas flow and chamber pressure control. APPLIED MATERIALS Centura Hart AP reactor has the power to accurately etch extremely thin layers of materials. It operates in manual or automated modes, with a proven repeatability of 0.01 microns, and a temperature range from -79°C to 38°C. Additionally, its built-in resistivity sensor offers precise control of the etching process. The reactor also features an intuitive user interface, giving users the ability to monitor the process in real-time. Sophisticated software allows users to control and adjust the chamber pressure, gas flow, and electrode spacing from an off-site interface. Additionally, this software includes advanced safety controls and built-in etching recipes, making it easy to switch or adjust the process parameters. Centura Hart AP reactor is a powerful etching tool designed to meet the most demanding photoresist and reactive ion etching applications. Constructed from hardened steel and offering superior precision, the asset is capable of creating extremely thin layers. The intuitive user interface and advanced safety controls make it easy to operate, and the included software offers a variety of etching recipes. This model offers the highest accuracy and throughput, while reducing capital and operational costs.